Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 10/20 | 0.59 |
| ▸ | GAA | P10253 | 7/20 | 0.59 |
| ▸ | MAPT | P10636 | 4/20 | 0.59 |
| ▸ | MEN1 | O00255 | 3/20 | 0.59 |
| ▸ | KMT2A | Q03164 | 3/20 | 0.59 |
| ▸ | PKM | P14618 | 3/20 | 0.59 |
| ▸ | RECQL | P46063 | 2/20 | 0.59 |
| ▸ | ESR1 | P03372 | 3/20 | 0.50 |
| ▸ | ESR2 | Q92731 | 2/20 | 0.50 |
| ▸ | CHEK1 | O14757 | 1/20 | 0.44 |
| ▸ | FYN | P06241 | 1/20 | 0.44 |
| ▸ | PDGFRB | P09619 | 1/20 | 0.44 |
| ▸ | PIM1 | P11309 | 1/20 | 0.44 |
| ▸ | FGFR1 | P11362 | 1/20 | 0.44 |
| ▸ | FLT1 | P17948 | 1/20 | 0.44 |
| ▸ | GRK5 | P34947 | 1/20 | 0.44 |
| ▸ | MAP2K2 | P36507 | 1/20 | 0.44 |
| ▸ | MAPK8 | P45983 | 1/20 | 0.44 |
| ▸ | CDK8 | P49336 | 1/20 | 0.44 |
| ▸ | RPS6KA3 | P51812 | 1/20 | 0.44 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL29379543 | 1.00 | ALDH1A1 (0.59) | ALDH1A1GAAMAPTMEN1KMT2A | |
| SCHEMBL29360962 | 1.00 | ALDH1A1 (0.59) | ALDH1A1GAAMAPTMEN1KMT2A | |
| Ammonia Solution, Strong SCHEMBL48746 | 0.98 | ALDH1A1 (0.57) | ALDH1A1GAAMAPTMEN1KMT2A | |
| Hydrochloric Acid SCHEMBL8977755 | 0.98 | ALDH1A1 (0.57) | ALDH1A1GAAMAPTMEN1KMT2A | |
| SCHEMBL4295432 | 0.93 | ALDH1A1 (0.52) | ALDH1A1GAAMAPTMEN1KMT2A | |
| SCHEMBL14665668 | 0.91 | ALDH1A1 (0.55) | ALDH1A1GAAMAPTMEN1KMT2A | |
| SCHEMBL28561388 | 0.91 | ALDH1A1 (0.50) | ALDH1A1GAAMAPTMEN1KMT2A | |
| SCHEMBL13878423 | 0.91 | ALDH1A1 (0.50) | ALDH1A1GAAMAPTMEN1KMT2A | |
| Questiomycin B SCHEMBL4623183 | 0.91 | ALOX15 (0.52) | ALDH1A1GAAMAPTMEN1KMT2A | |
| SCHEMBL14476250 | 0.90 | ALDH1A1 (0.53) | ALDH1A1GAAMAPTMEN1KMT2A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Appears in 3643 patents — a generic fragment claimed broadly, so it's down-weighted as IP noise. Top by claim status then date:
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-3891196-B1 | FLUOROELASTOMER COMPOSITION FOR HIGH THERMAL RATING | SYENSQO SPECIALTY POLYMERS ITALY S P A (IT) | 2025-12-24 | — | — | EP | claimed |
| US-12486369-B2 | Polyimide-based film having excellent surface evenness and method for producing same | KOLON INDUSTRIES, INC. (KR) | 2025-12-02 | — | — | US | claimed |
| EP-4615204-A1 | OPTICAL FILM HAVING EXCELLENT CRUSH RESISTANCE AND DISPLAY DEVICE COMPRISING SAME | Kolon Industries, Inc. (KR) | 2025-09-10 | — | — | EP | claimed |
| EP-4036159-B1 | POLYIMIDE-BASED FILM HAVING EXCELLENT SURFACE EVENNESS AND METHOD FOR PRODUCING SAME | KOLON INC (KR) | 2025-08-06 | — | — | EP | claimed |
| WO-2025128627-A1 | FLUORINATED THERMOPLASTIC POLYURETHANE | ABIOMED, INC. (US) | 2025-06-19 | — | — | WO | claimed |
| US-20250188216-A1 | FLUORINATED THERMOPLASTIC POLYURETHANE | ABIOMED, INC. (US) | 2025-06-12 | — | — | US | claimed |
| US-12321097-B2 | Method of removing photoresist, laminate, method of forming metallic pattern, polyimide resin and stripper | ECHEM SOLUTIONS CORP. (TW) | 2025-06-03 | — | — | US | claimed |
| US-20250130494-A1 | POSITIVE TYPE PHOTOSENSITIVE RESIN COMPOSITION AND METHODS OF MAKING SAME | AKRON POLYMER SYSTEMS, INC. (US) | 2025-04-24 | — | — | US | claimed |
| US-12247104-B2 | Polyamic acid resin, polyimide resin, and resin composition including these | NIPPON KAYAKU KABUSHIKI KAISHA (JP) | 2025-03-11 | — | — | US | claimed |
| WO-2025048359-A1 | SOLVENT-SOLUBLE POLYIMIDE WITH SIMPLIFIED PREPARATION PROCESS AND PREPARATION METHOD THEREFOR | 피아이첨단소재 주식회사 | 2025-03-06 | — | — | WO | claimed |
| US-5011753-A | Polyamides Containing Hexafluoroisopropylidene Groups Which May Be Cured To Form Polybenzoxazoles | HOECHST CELANESE CORPORATION (US) | 1991-04-30 | — | — | US | claimed |
| US-4939215-A | CHEMICAL AND RADIATION RESISTANCE; AIRCRAFT, ELECTRONICS | HOECHST CELANESE CORPORATION (US) | 1990-07-03 | — | — | US | claimed |
| US-4931532-A | CONDENSING DICARBOXLYIC ACID WITH 4,4'-HEXAFLUOROISOPROPLIDENE BIS(2-AMINOPHENOL), DEHYDRATING AGENT; LOW GLASS TRANSITION TEMPERATURE | THE UNITED STATES OF AMERICA AS REPRESENTED BY THE SECRETARY OF THE AIR FORCE (US) | 1990-06-05 | — | — | US | claimed |
| US-4927736-A | Hydroxy polyimides and high temperature positive photoresists therefrom | HOECHST CELANESE CORPORATION (US) | 1990-05-22 | — | — | US | claimed |
| US-4849051-A | Heat resistant positive resists and method for preparing heat-resistant relief structures | SIEMENS AKTIENGESELLSCHAFT (DE) | 1989-07-18 | — | — | US | claimed |
| US-4845183-A | MOLDING MATERIALS; FOR DIELECTRICS OR COATING SOLUTIONS; TOUGHNESS, FLEXIBILITY, TRANSPARENT | HOECHST CELANESE CORPORATION (US) | 1989-07-04 | — | — | US | claimed |
| EP-0291778-A1 | Process for the preparation of high temperature-resistant dielectrics | SIEMENS AKTIENGESELLSCHAFT (DE) | 1988-11-23 | — | — | EP | claimed |
| EP-0110420-B1 | VULCANIZABLE NITRILE-CONTAINING PERFLUOROELASTOMER | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1986-10-08 | — | — | EP | claimed |
| US-4525539-A | CURING AGENT IS BIS(AMINOPHENOLS) OR AROMATIC TETRAAMINE | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1985-06-25 | — | — | US | claimed |
| EP-0110420-A1 | Vulcanizable nitrile-containing perfluoroelastomer | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1984-06-13 | — | — | EP | claimed |