Predicted protein targets (top 13)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ATM | Q13315 | 1/20 | 0.42 |
| ▸ | HCAR2 | Q8TDS4 | 6/20 | 0.40 |
| ▸ | MAPT | P10636 | 2/20 | 0.36 |
| ▸ | THRB | P10828 | 1/20 | 0.34 |
| ▸ | APP | P05067 | 4/20 | 0.33 |
| ▸ | RAB9A | P51151 | 1/20 | 0.33 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.33 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.33 |
| ▸ | TSHR | P16473 | 3/20 | 0.32 |
| ▸ | HPGD | P15428 | 1/20 | 0.32 |
| ▸ | TP53 | P04637 | 2/20 | 0.31 |
| ▸ | HIF1A | Q16665 | 2/20 | 0.31 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL25622958 | 0.79 | HCAR2 (0.50) | ATMHCAR2MAPTTHRBRAB9A | |
| SCHEMBL12594176 | 0.79 | HCAR2 (0.60) | ATMHCAR2MAPTRAB9ANPSR1 | |
| SCHEMBL534938 | 0.79 | ATM (0.47) | ATMHCAR2MAPTAPPRAB9A | |
| SCHEMBL9561910 | 0.78 | HCAR2 (0.63) | ATMHCAR2MAPTAPPRAB9A | |
| SCHEMBL691276 | 0.78 | HCAR2 (0.63) | ATMHCAR2MAPTAPPRAB9A | |
| SCHEMBL691277 | 0.78 | HCAR2 (0.63) | ATMHCAR2MAPTAPPRAB9A | |
| SCHEMBL19055835 | 0.78 | ATM (0.38) | ATMHCAR2MAPTTHRBRAB9A | |
| SCHEMBL3390981 | 0.77 | ALDH1A1 (0.52) | ATMHCAR2MAPTTHRBAPP | |
| SCHEMBL181611 | 0.77 | ATM (0.45) | ATMHCAR2MAPTAPPRAB9A | |
| SCHEMBL14765609 | 0.76 | ATM (0.41) | ATMHCAR2MAPTTHRBRAB9A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20230408921-A1 | Polymerizable Monomer, Polymer Compound, Resist Composition, And Patterning Process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-12-21 | — | — | US | disclosed |
| EP-4273624-A1 | NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, PATTERNING PROCESS, INTERLAYER INSULATING FILM, SURFACE PROTECTION FILM, AND ELECTRONIC COMPONENT | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-11-08 | — | — | EP | disclosed |
| US-20230350294-A1 | Negative Photosensitive Resin Composition, Patterning Process, Interlayer Insulating Film, Surface Protection Film, And Electronic Component | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-11-02 | — | — | US | disclosed |