Benzene

Benzene

SCHEMBL2676112

O=C(O)O.O=C(O)O.O=C(O)O.c1ccccc1

nearest known ligand 0.71

Full drug profile on Sugi Atlas →

Known targets — ChEMBL curated mechanism

GSK3AGSK3BIMPA1

The experimentally established mechanism targets of Benzene. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CA1 P00915 3/20 0.71
CA2 P00918 3/20 0.71
CA9 Q16790 3/20 0.71
TSHR P16473 6/20 0.43
TP53 P04637 3/20 0.43
CES2 O00748 3/20 0.40
CES1 P23141 3/20 0.40
ALDH1A1 P00352 2/20 0.40
ALOX15 P16050 2/20 0.40
DAO P14920 1/20 0.40
NAPRT Q6XQN6 1/20 0.40
ACHE P22303 1/20 0.40
FFAR3 O14843 1/20 0.40
LCK P06239 1/20 0.40
FYN P06241 1/20 0.40
TDP1 Q9NUW8 2/20 0.35
CA12 O43570 2/20 0.35
CA7 P43166 2/20 0.35
CA14 Q9ULX7 2/20 0.35
POLB P06746 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Benzene SCHEMBL2416723 1.00 CA1 (0.71) CA1CA2CA9TSHRTP53
Benzene SCHEMBL6259045 1.00 CA1 (0.71) CA1CA2CA9TSHRTP53
Benzene SCHEMBL3284185 1.00 CA1 (0.71) CA1CA2CA9TSHRTP53
Benzene SCHEMBL1122633 1.00 CA1 (0.71) CA1CA2CA9TSHRTP53
Benzene SCHEMBL725167 1.00 CA1 (0.71) CA1CA2CA9TSHRTP53
Benzene SCHEMBL5081287 1.00 CA1 (0.71) CA1CA2CA9TSHRTP53
Benzene SCHEMBL10964916 1.00 CA1 (0.71) CA1CA2CA9TSHRTP53
Benzene SCHEMBL377044 1.00 CA1 (0.71) CA1CA2CA9TSHRTP53
Benzene SCHEMBL10961254 1.00 CA1 (0.71) CA1CA2CA9TSHRTP53
Benzene SCHEMBL11822273 0.94 CA1 (0.62) CA1CA2CA9TSHRTP53

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 15 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-116478417-B Chiral covalent organic framework material based on boric acid ester, chiral separation membrane, preparation method and application thereof 绍兴文理学院 2024-06-28 CN disclosed
CN-116478417-A Chiral covalent organic framework material based on boric acid ester, chiral separation membrane, preparation method and application thereof 绍兴文理学院 2023-07-25 CN disclosed
US-8173720-B2 Transparent gel and contact lense from the same MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2012-05-08 US disclosed
EP-1840167-B1 TRANSPARENT GEL AND CONTACT LENS COMPRISING THE SAME MENICON CO LTD (JP) 2010-10-06 EP disclosed
US-20090012205-A1 TRANSPARENT GEL AND CONTACT LENSE FROM THE SAME MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2009-01-08 US disclosed
EP-1945830-A1 CARRIER WITH POROUS VACUUM COATING Weinert, Hilmar (DE) 2008-07-23 EP disclosed
EP-1840167-A1 TRANSPARENT GEL AND CONTACT LENS COMPRISING THE SAME MENICON CO., LTD. (JP) 2007-10-03 EP disclosed
WO-2007054229-A1 CARRIER WITH POROUS VACUUM COATING WEINERT HILMAR (DE) 2007-05-18 WO disclosed
EP-1304924-A2 COMPOSITIONS FOR REPELLING CRAWLING INSECTS Bayer Aktiengesellschaft (DE) 2003-05-02 EP disclosed
WO-2002005646-A2 COMPOSITIONS FOR REPELLING CRAWLING INSECTS S.C. JOHNSON & SON, INC. (US) (US) 2002-01-24 WO disclosed
US-6093784-A (CO)POLYCARBONATE CONTAINING DIARYLAMINOPHENYL-SUBSTITUTED BISPHENOL UNITS; DURABILITY, HEAT RESISTANCE, RADIATION TRANSPARENCY RICOH COMPANY, LTD. (JP) 2000-07-25 US disclosed
US-5981146-A CONTAINING A COMPOUND HAVING A SULFONIC ACID GROUP OR A CARBONIC ACID GROUP IS FORMED ON A CHEMICAL-AMPLIFICATION-TYPE RESIST FILM OF A SEMICONDUCTTOR SUBSTRATE, FOLLOWED BY PERFORMING EXPOSURE MITSUBISHI DENKI KABUSHIKI KAISHA (JP) 1999-11-09 US disclosed
US-5191036-A Polycarbonate, aromatic polyestersiloxane block polymer, impact strength MITSUBISHI RAYON CO., LTD. (JP) 1993-03-02 US disclosed
US-5084527-A Polyestersiloxane copolymers for impact strength MITSUBISHI RAYON CO., LTD. (JP) 1992-01-28 US disclosed
EP-0384460-A1 Thermoplastic resin composition MITSUBISHI RAYON CO., LTD (JP) 1990-08-29 EP disclosed