⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL267646 | 1.00 | — | — | |
| SCHEMBL1896569 | 0.82 | — | — | |
| SCHEMBL6867041 | 0.82 | — | — | |
| SCHEMBL6867042 | 0.82 | — | — | |
| SCHEMBL2844495 | 0.82 | — | — | |
| SCHEMBL634297 | 0.82 | — | — | |
| SCHEMBL6421826 | 0.82 | — | — | |
| SCHEMBL634298 | 0.82 | — | — | |
| SCHEMBL716950 | 0.82 | — | — | |
| Hydrochloric Acid SCHEMBL9083519 | 0.82 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1056 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-12176211-B2 | Reflection mode photomask | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) | 2024-12-24 | — | — | US | claimed |
| CN-118241069-B | Hard alloy for mining tool with tantalum carbide dispersed and distributed and preparation method thereof | 崇义章源钨业股份有限公司 | 2024-08-16 | — | — | CN | claimed |
| CN-113314523-B | Semiconductor device and method of manufacturing the same | 台湾积体电路制造股份有限公司 | 2024-07-16 | — | — | CN | claimed |
| US-11848368-B2 | Transistors with different threshold voltages | TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. (TW) | 2023-12-19 | — | — | US | claimed |
| US-11830938-B2 | Bipolar junction device | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) | 2023-11-28 | — | — | US | claimed |
| US-20230369313-A1 | ELECTROSTATIC DISCHARGE PREVENTION | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) | 2023-11-16 | — | — | US | claimed |
| US-20230369466-A1 | METHOD FOR FORMING SEMICONDUCTOR DEVICE | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) | 2023-11-16 | — | — | US | claimed |
| US-20230360914-A1 | REFLECTION MODE PHOTOMASK | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) | 2023-11-09 | — | — | US | claimed |
| US-11735421-B2 | Reflection mode photomask and method of making | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) | 2023-08-22 | — | — | US | claimed |
| US-11721622-B2 | Semiconductor devices | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2023-08-08 | — | — | US | claimed |
| CN-1037723-C | Method for manufacturing read-only memory by ion implantation technology | MAOXI ELECTRONIC CO LTD TAIWAN (CN) | 1998-03-11 | — | — | CN | claimed |
| CN-1166061-A | Method for manufacturing thin film resistor | GUOJU CO LTD (CN) | 1997-11-26 | — | — | CN | claimed |
| CN-1120232-A | Method for manufacturing read-only memory by ion implantation technology | MAOXI ELECTRONIC CO LTD TAIWAN (CN) | 1996-04-10 | — | — | CN | claimed |
| US-5341016-A | Low resistance device element and interconnection structure | MICRON SEMICONDUCTOR, INC. (US) | 1994-08-23 | — | — | US | claimed |
| US-5110422-A | METHOD FOR PRODUCING AN ADHERENT METAL DEPOSIT ON CARBON, AND MIRROR OBTAINED BY THIS METHOD | OFFICE NATIONAL D'ETUDES ET DE RECHERCHES AEROSPATIALES (FR) | 1992-05-05 | — | — | US | claimed |
| US-4708915-A | Thermal head for thermal recording | KYOCERA CORPORATION (JP) | 1987-11-24 | — | — | US | claimed |
| EP-0244458-A1 | HIGH VOLUME FRACTION REFRACTORY OXIDE, THERMAL SHOCK RESISTANT COATINGS. | UNION CARBIDE CORP (US) | 1987-11-11 | — | — | EP | claimed |
| WO-1987002389-A2 | HIGH VOLUME FRACTION REFRACTORY OXIDE, THERMAL SHOCK RESISTANT COATINGS | UNION CARBIDE CORPORATION (US) | 1987-04-23 | — | — | WO | claimed |
| US-4593454-A | Process for manufacturing an integrated circuit with tantalum silicide connections utilizing self-aligned oxidation | Societe pour d'Etude et la Fabrication de Circuits Integres Speciaux EFCS (FR) | 1986-06-10 | — | — | US | claimed |
| US-3944683-A | Methods of producing chemically hardening coatings | KAMAN SCIENCES CORPORATION (US) | 1976-03-16 | — | — | US | claimed |