⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL6867042 | 1.00 | — | — | |
| SCHEMBL4579528 | 0.87 | — | — | |
| SCHEMBL32659725 | 0.87 | — | — | |
| SCHEMBL2112050 | 0.82 | — | — | |
| SCHEMBL267645 | 0.82 | — | — | |
| SCHEMBL29576452 | 0.82 | — | — | |
| SCHEMBL267646 | 0.82 | — | — | |
| SCHEMBL565229 | 0.82 | — | — | |
| SCHEMBL565228 | 0.82 | — | — | |
| SCHEMBL30522314 | 0.82 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-6818990-B2 | Fluorine diffusion barriers for fluorinated dielectrics in integrated circuits | RENSSELAER POLYTECHNIC INSTITUTE | 2004-11-16 | — | — | US | claimed |
| US-20030057553-A1 | Comprises fluorinated dielectric layer and fluorine diffusion barrier adjacent dielectric layer, wherein fluorine diffusion barrier comprises doped or undoped silicon with tantalum, tantalum nitride, tantalum silicide, cobalt, cobalt silicide | RENSSELAER POLYTECHNIC INSTITUTE | 2003-03-27 | — | — | US | claimed |
| US-6818990-B2 | Fluorine diffusion barriers for fluorinated dielectrics in integrated circuits | RENSSELAER POLYTECHNIC INSTITUTE | 2004-11-16 | — | — | US | disclosed |
| US-20030057553-A1 | Comprises fluorinated dielectric layer and fluorine diffusion barrier adjacent dielectric layer, wherein fluorine diffusion barrier comprises doped or undoped silicon with tantalum, tantalum nitride, tantalum silicide, cobalt, cobalt silicide | RENSSELAER POLYTECHNIC INSTITUTE | 2003-03-27 | — | — | US | disclosed |