Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 2/20 | 0.39 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.39 |
| ▸ | FAAH | O00519 | 1/20 | 0.35 |
| ▸ | PRSS1 | P07477 | 1/20 | 0.35 |
| ▸ | PRSS2 | P07478 | 1/20 | 0.35 |
| ▸ | ELANE | P08246 | 1/20 | 0.35 |
| ▸ | PRTN3 | P24158 | 1/20 | 0.35 |
| ▸ | PRSS3 | P35030 | 1/20 | 0.35 |
| ▸ | POLB | P06746 | 2/20 | 0.35 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.35 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.35 |
| ▸ | SNCA | P37840 | 1/20 | 0.33 |
| ▸ | SRC | P12931 | 1/20 | 0.32 |
| ▸ | HTR6 | P50406 | 1/20 | 0.32 |
| ▸ | PTGS2 | P35354 | 1/20 | 0.32 |
| ▸ | CA2 | P00918 | 3/20 | 0.31 |
| ▸ | CA12 | O43570 | 2/20 | 0.31 |
| ▸ | CA9 | Q16790 | 2/20 | 0.31 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.31 |
| ▸ | APOBEC3G | Q9HC16 | 2/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2435600 | 1.00 | TSHR (0.39) | TSHRSMN1; SMN2FAAHPRSS1PRSS2 | |
| SCHEMBL1476157 | 0.93 | FAAH (0.39) | TSHRSMN1; SMN2FAAHPRSS1PRSS2 | |
| SCHEMBL7914149 | 0.93 | FAAH (0.39) | TSHRSMN1; SMN2FAAHPRSS1PRSS2 | |
| SCHEMBL561475 | 0.93 | FAAH (0.39) | TSHRSMN1; SMN2FAAHPRSS1PRSS2 | |
| SCHEMBL5078707 | 0.93 | FAAH (0.39) | TSHRSMN1; SMN2FAAHPRSS1PRSS2 | |
| SCHEMBL2283421 | 0.93 | FAAH (0.39) | TSHRSMN1; SMN2FAAHPRSS1PRSS2 | |
| SCHEMBL7102917 | 0.93 | FAAH (0.39) | TSHRSMN1; SMN2FAAHPRSS1PRSS2 | |
| SCHEMBL7038440 | 0.89 | CA12 (0.39) | TSHRSMN1; SMN2CYP2D6TDP1CA2 | |
| Sulfuric Acid SCHEMBL5798237 | 0.89 | TSHR (0.44) | TSHRSMN1; SMN2POLBCYP2D6TDP1 | |
| SCHEMBL1477345 | 0.85 | ALDH1A1 (0.40) | TDP1CA2ALDH1A1CA1KMT2A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 39 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-5981146-A | CONTAINING A COMPOUND HAVING A SULFONIC ACID GROUP OR A CARBONIC ACID GROUP IS FORMED ON A CHEMICAL-AMPLIFICATION-TYPE RESIST FILM OF A SEMICONDUCTTOR SUBSTRATE, FOLLOWED BY PERFORMING EXPOSURE | MITSUBISHI DENKI KABUSHIKI KAISHA (JP) | 1999-11-09 | — | — | US | claimed |
| EP-0568496-B1 | Photoresist materials based on polystyrene | OLIN MICROELECTRONIC CHEM INC (US) | 1998-12-30 | — | — | EP | claimed |
| EP-0568496-A2 | Photoresist materials based on polystyrene | OCG Microelectronic Materials Inc. (US) | 1993-11-03 | — | — | EP | claimed |
| US-5100762-A | Radiation-sensitive polymer and radiation-sensitive composition containing the same | MITSUBISHI DENKI KABUSHIKI KAISHA (JP) | 1992-03-31 | — | — | US | claimed |
| CN-114901468-B | Laminate, method for producing same, and exterior material for automobile | 三菱化学株式会社 | 2024-04-30 | — | — | CN | disclosed |
| WO-2024045679-A1 | ZN-BASED ORGANIC COORDINATION NANOPARTICLES AND PREPARATION METHOD THEREFOR, PHOTORESIST COMPOSITION, AND USE THEREOF | 清华大学 | 2024-03-07 | — | — | WO | disclosed |
| WO-2024046107-A1 | ZN-BASED ORGANICALLY-COORDINATED NANOPARTICLES, PHOTORESIST COMPOSITION, PREPARATION METHOD THEREFOR, AND USE THEREOF | 清华大学 | 2024-03-07 | — | — | WO | disclosed |
| WO-2024046108-A1 | ZN-BASED ORGANIC COORDINATION NANOPARTICLE AND PREPARATION METHOD THEREFOR, PHOTORESIST COMPOSITION CONTAINING SAME, AND USE THEREOF | 清华大学 | 2024-03-07 | — | — | WO | disclosed |
| US-20230154750-A1 | Photoresist and Method | TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. (TW) | 2023-05-18 | — | — | US | disclosed |
| CN-115960483-A | Method for reducing shrinkage stress of photocureable coating by using pH-responsive cationic microgel | 江南大学 | 2023-04-14 | — | — | CN | disclosed |
| US-20220298397-A1 | LAMINATE, PRODUCTION METHOD THEREFOR, AND AUTOMOTIVE EXTERIOR MATERIAL | MITSUBISHI CHEMICAL CORPORATION (JP) | 2022-09-22 | — | — | US | disclosed |
| WO-2021132148-A1 | LAMINATED BODY AND PRODUCTION METHOD THEREFOR, AND AUTOMOTIVE EXTERIOR MATERIAL | 三菱ケミカル株式会社 | 2021-07-01 | — | — | WO | disclosed |
| US-5776657-A | Wet-chemical developable, etch-stable photoresist for UV radiation with a wavelength below 200 NM | OCG MICROELECTRONIC MATERIALS, INC. (US) | 1998-07-07 | — | — | US | disclosed |
| US-5633112-A | Photosensitive resin composition containing a carboxylic acid polymer, photoacid generator and secondary or tertiary aliphatic amine | HITACHI, LTD. (JP) | 1997-05-27 | — | — | US | disclosed |
| EP-0737897-A1 | Wet developable etch resistant photoresist for UV-exposure at wavelength below 200 nm | OCG Microelectronic Materials Inc. (US) | 1996-10-16 | — | — | EP | disclosed |
| US-5565304-A | ALKALI SOLUBLE BINDER RESIN FROM HYDROXYSTYRENEAND METHYLOLATED PHENOLIC COMPOUND | OCG MICROELECTRONIC MATERIALS, INC. (US) | 1996-10-15 | — | — | US | disclosed |
| US-5550004-A | RESIN BINDER HAVING HYDROXYSTYRENE AND MONOMETHYLOLATED PHENOLIC COMPOUNDS | OCG MICROELECTRONIC MATERIALS, INC. (US) | 1996-08-27 | — | — | US | disclosed |
| EP-0727711-A2 | Photoresist compositions containing supercritical fluid fractionated polymeric binder resins | OCG MICROELECTRONIC MATERIALS, INC. (US) | 1996-08-21 | — | — | EP | disclosed |
| EP-0697632-A2 | Chemically amplified radiation-sensitive composition | OCG MICROELECTRONIC MATERIALS, INC. (US) | 1996-02-21 | — | — | EP | disclosed |
| US-5100762-A | Radiation-sensitive polymer and radiation-sensitive composition containing the same | MITSUBISHI DENKI KABUSHIKI KAISHA (JP) | 1992-03-31 | — | — | US | disclosed |