SCHEMBL7038440

SCHEMBL7038440

Cc1ccc([S+](c2ccccc2)c2ccccc2)cc1.O=S(=O)(O)F.O=S(=O)(O)F.O=S(=O)([O-])F

nearest known ligand 0.39

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CA12 O43570 3/20 0.39
CA9 Q16790 3/20 0.39
CA1 P00915 2/20 0.39
CA2 P00918 2/20 0.39
RECQL P46063 1/20 0.38
SMN1; SMN2 Q16637 2/20 0.38
HTT P42858 1/20 0.38
GAA P10253 4/20 0.37
CYP2D6 P10635 2/20 0.37
CYP1A2 P05177 2/20 0.37
CYP3A4 P08684 2/20 0.37
ALDH1A1 P00352 2/20 0.37
TDP1 Q9NUW8 2/20 0.37
KDM4E B2RXH2 1/20 0.37
CYP2C9 P11712 1/20 0.37
HPGD P15428 1/20 0.37
ALOX12 P18054 1/20 0.37
CYP2C19 P33261 1/20 0.37
GFER P55789 1/20 0.37
LMNA P02545 3/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1478485 0.93 GAA (0.41) CA12CA9CA1CA2SMN1; SMN2
SCHEMBL1478611 0.93 GAA (0.41) CA12CA9CA1CA2SMN1; SMN2
SCHEMBL2435600 0.89 TSHR (0.39) CA12CA9CA1CA2SMN1; SMN2
SCHEMBL2679092 0.89 TSHR (0.39) CA12CA9CA1CA2SMN1; SMN2
SCHEMBL4365037 0.85 CA12 (0.43) CA12CA9CA1CA2RECQL
SCHEMBL3144525 0.84 CA12 (0.46) CA12CA9CA1CA2RECQL
SCHEMBL2964104 0.84 CA12 (0.46) CA12CA9CA1CA2RECQL
SCHEMBL561475 0.83 FAAH (0.39) CA12CA9CA1CA2SMN1; SMN2
SCHEMBL5078707 0.83 FAAH (0.39) CA12CA9CA1CA2SMN1; SMN2
SCHEMBL2283421 0.83 FAAH (0.39) CA12CA9CA1CA2SMN1; SMN2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0955563-B1 A photoresist composition SUMITOMO CHEMICAL CO (JP) 2003-03-19 EP disclosed
US-6153349-A COMPRISING POLYVINYLPHENOL DERIVATIVE RESIN SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2000-11-28 US disclosed
EP-0955563-A1 A photoresist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 1999-11-10 EP disclosed