SCHEMBL26793696

SCHEMBL26793696

C=Cc1cccc2cc3c(O)ccc(C(F)(F)F)c3cc12

nearest known ligand 0.46

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
▸ HSD17B1 P14061 7/20 0.46
▸ HSD17B2 P37059 7/20 0.46
▸ ESR1 P03372 3/20 0.37
▸ ESR2 Q92731 3/20 0.37
▸ SLC9A1 P19634 1/20 0.33
▸ MEN1 O00255 1/20 0.32
▸ MITF O75030 1/20 0.32
▸ ALDH1A1 P00352 1/20 0.32
▸ CYP1A2 P05177 1/20 0.32
▸ MAPT P10636 1/20 0.32
▸ CYP2C9 P11712 1/20 0.32
▸ PKM P14618 1/20 0.32
▸ MAPK1 P28482 1/20 0.32
▸ RAB9A P51151 1/20 0.32
▸ CCR6 P51684 1/20 0.32
▸ KMT2A Q03164 1/20 0.32
▸ NPSR1 Q6W5P4 1/20 0.32
▸ PLAU P00749 1/20 0.31
▸ ERN1 O75460 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4199563 0.78 GRIN2D (0.44) HSD17B1HSD17B2ESR1ESR2MEN1
SCHEMBL11060525 0.78 HSD17B1 (0.50) HSD17B1HSD17B2ESR1MEN1ALDH1A1
SCHEMBL17341738 0.76 HSD17B1 (0.44) HSD17B1HSD17B2SLC9A1MEN1CYP1A2
SCHEMBL17341740 0.72 HSD17B1 (0.48) HSD17B1HSD17B2ESR1ESR2MEN1
Anthracene SCHEMBL28971423 0.69 ALDH1A1 (0.54) ESR1ESR2SLC9A1MEN1MITF
SCHEMBL29891468 0.69 ALDH1A1 (0.54) ESR1ESR2SLC9A1MEN1MITF
SCHEMBL27113 0.69 ALDH1A1 (0.54) ESR1ESR2SLC9A1MEN1MITF
SCHEMBL20930329 0.69 ESR2 (0.38) ESR1ESR2MEN1ALDH1A1MAPT
Phosphonic Acid SCHEMBL27730904 0.68 ALDH1A1 (0.50) ESR1ESR2SLC9A1MEN1MITF
SCHEMBL1167375 0.68 ALDH1A1 (0.53) SLC9A1MEN1MITFALDH1A1CYP1A2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-4282885-A1 ACTINIC-RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC-RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, METHOD FOR FORMING PATTERN, AND METHOD FOR PRODUCING ELECTRONIC DEVICE FUJIFILM Corporation (JP) 2023-11-29 — — EP disclosed
US-20230367210-A1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE FUJIFILM CORPORATION (JP) 2023-11-16 — — US disclosed
US-20230367210-A1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE FUJIFILM CORPORATION (JP) 2023-11-16 — — US disclosed
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