⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL25703465 | 0.80 | RXFP1 (0.33) | — | |
| SCHEMBL24845657 | 0.74 | HDAC3 (0.34) | — | |
| SCHEMBL25972279 | 0.68 | KDM4E (0.36) | — | |
| SCHEMBL25470387 | 0.66 | STS (0.32) | — | |
| SCHEMBL21014708 | 0.65 | HDAC3 (0.33) | — | |
| SCHEMBL23065534 | 0.63 | HDAC3 (0.33) | — | |
| SCHEMBL22454822 | 0.62 | GABRA1 (0.33) | — | |
| SCHEMBL26059444 | 0.62 | SOS1 (0.32) | — | |
| SCHEMBL26939121 | 0.62 | HDAC3 (0.34) | — | |
| SCHEMBL22097472 | 0.61 | HDAC3 (0.39) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20230367210-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2023-11-16 | — | — | US | disclosed |