Sugi Predict

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SCHEMBL25470387

SCHEMBL25470387

O=C(c1ccc(OS(=O)(=O)C(F)(F)C(F)(F)C(F)(F)S(=O)(=O)O)cc1)[NH+]([O-])S(=O)(=O)C(F)(F)C(F)(F)C(F)(F)S(=O)(=O)O

nearest known ligand 0.32

Predicted protein targets (top 4)

geneUniProtsupporting neighboursconfidence
▸ STS P08842 2/20 0.32
▸ ENPP3 O14638 1/20 0.31
▸ ENPP1 P22413 1/20 0.31
▸ ENPP2 Q13822 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9966114 0.79 KMT2A (0.43) STS
SCHEMBL25470385 0.77 STS (0.39) STS
SCHEMBL9966121 0.76 LMNA (0.38) —
SCHEMBL9966140 0.76 STS (0.55) STS
SCHEMBL25972279 0.74 KDM4E (0.36) —
SCHEMBL23808361 0.74 ENPP1 (0.36) STSENPP3ENPP1ENPP2
SCHEMBL9966117 0.73 CA1 (0.46) —
SCHEMBL9966120 0.73 CA2 (0.35) —
SCHEMBL3753755 0.73 CA1 (0.42) STS
SCHEMBL10204305 0.72 HDAC3 (0.39) STS

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230367210-A1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE FUJIFILM CORPORATION (JP) 2023-11-16 — — US disclosed
US-20230148344-A1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, PATTERN FORMING METHOD, RESIST FILM, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, COMPOUND, AND METHOD FOR PRODUCING COMPOUND FUJIFILM CORPORATION (JP) 2023-05-11 — — US disclosed