SCHEMBL26807774

SCHEMBL26807774

CN1C(C)(C)CC(OC(=O)c2cc(I)cc(I)c2I)C1(C)C

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL26807771 0.89 TTR (0.34) —
SCHEMBL26807777 0.86 TSHR (0.30) —
SCHEMBL26427858 0.85 TSHR (0.37) —
SCHEMBL26807781 0.81 MEN1 (0.36) —
SCHEMBL26807782 0.81 PTPN2 (0.37) —
SCHEMBL26807779 0.81 MAP2K2 (0.35) —
SCHEMBL26807766 0.80 PTPN2 (0.48) —
SCHEMBL26807791 0.79 PTPN2 (0.38) —
SCHEMBL26807786 0.79 MGLL (0.34) —
SCHEMBL26807785 0.79 KMT2A (0.34) —

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11829067-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-11-28 — — US disclosed
US-11829067-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-11-28 — — US disclosed
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