⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL26059444 | 0.88 | SOS1 (0.32) | — | |
| SCHEMBL26938024 | 0.83 | CA12 (0.30) | — | |
| SCHEMBL22454822 | 0.83 | GABRA1 (0.33) | — | |
| SCHEMBL23059985 | 0.82 | SOS1 (0.31) | — | |
| SCHEMBL26064956 | 0.80 | — | — | |
| SCHEMBL26059873 | 0.79 | — | — | |
| SCHEMBL19756001 | 0.79 | KDM4E (0.31) | — | |
| SCHEMBL23559349 | 0.77 | ALDH1A1 (0.32) | — | |
| SCHEMBL25739037 | 0.77 | GABRA1 (0.36) | — | |
| SCHEMBL23383201 | 0.77 | TTR (0.37) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2024142681-A1 | RADIATION-SENSITIVE COMPOSITION AND METHOD FOR FORMING RESIST PATTERN | JSR株式会社 | 2024-07-04 | — | — | WO | disclosed |
| US-20230400768-A1 | RADIATION-SENSITIVE COMPOSITION AND METHOD OF FORMING RESIST PATTERN | JSR CORPORATION (JP) | 2023-12-14 | — | — | US | disclosed |
| US-20230384676-A1 | RADIATION-SENSITIVE RESIN COMPOSITION, METHOD OF FORMING PATTERN, POLYMER, AND COMPOUND | JSR CORPORATION (JP) | 2023-11-30 | — | — | US | disclosed |