Predicted protein targets (top 9)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ATM | Q13315 | 1/20 | 0.43 |
| ▸ | CYP19A1 | P11511 | 1/20 | 0.37 |
| ▸ | GRM1 | Q13255 | 6/20 | 0.36 |
| ▸ | POLB | P06746 | 1/20 | 0.31 |
| ▸ | PDE4A | P27815 | 3/20 | 0.30 |
| ▸ | PDE4B | Q07343 | 3/20 | 0.30 |
| ▸ | PDE4C | Q08493 | 3/20 | 0.30 |
| ▸ | PDE4D | Q08499 | 3/20 | 0.30 |
| ▸ | SLC6A3 | Q01959 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL12228753 | 0.77 | ATM (0.53) | ATMCYP19A1GRM1POLB | |
| SCHEMBL12429872 | 0.77 | EPHX1 (0.40) | — | |
| SCHEMBL2681397 | 0.76 | EPHX1 (0.35) | — | |
| SCHEMBL2681392 | 0.75 | EPHX1 (0.38) | CYP19A1 | |
| SCHEMBL13714657 | 0.72 | CHRNB2 (0.37) | — | |
| SCHEMBL2680879 | 0.72 | CHRNB2 (0.37) | — | |
| SCHEMBL14509996 | 0.72 | CHRNB2 (0.37) | — | |
| SCHEMBL2681393 | 0.71 | — | — | |
| SCHEMBL26839834 | 0.70 | HSD11B1 (0.37) | — | |
| SCHEMBL15219695 | 0.70 | ATM (0.56) | ATMCYP19A1GRM1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20120249995-A1 | RESIST PROTECTIVE FILM MATERIAL AND PATTERN FORMATION METHOD | SHIN-ETSU CHEMICAL CO. LTD. (JP) | 2012-10-04 | — | — | US | disclosed |
| US-8088537-B2 | Resist top coat composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-01-03 | — | — | US | disclosed |
| US-7642034-B2 | Photoresists; (meth)acrylate fluoropolymer which is insoluble in water, dissolvable in aqueous alkaline solution, and immiscible with resist films so that it enables pattern formation by the immersion lithography | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2010-01-05 | — | — | US | disclosed |
| US-20090197200-A1 | Resist top coat composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2009-08-06 | — | — | US | disclosed |
| US-20070178407-A1 | Polymer, resist protective coating material, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. | 2007-08-02 | — | — | US | disclosed |
| US-20070122736-A1 | RESIST PROTECTIVE FILM MATERIAL AND PATTERN FORMATION METHOD | SHIN-ETSU CHEMICAL CO., LTD. | 2007-05-31 | — | — | US | disclosed |
| US-20070122741-A1 | Resist protective coating material and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2007-05-31 | — | — | US | disclosed |