Predicted protein targets (top 17)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CHRNB2 | P17787 | 2/20 | 0.37 |
| ▸ | CHRNA4 | P43681 | 2/20 | 0.37 |
| ▸ | CHRNB4 | P30926 | 1/20 | 0.37 |
| ▸ | CHRNA3 | P32297 | 1/20 | 0.37 |
| ▸ | CHRNA7 | P36544 | 1/20 | 0.37 |
| ▸ | CHRM2 | P08172 | 1/20 | 0.36 |
| ▸ | CHRM4 | P08173 | 1/20 | 0.36 |
| ▸ | CHRM3 | P20309 | 1/20 | 0.36 |
| ▸ | CYP1A2 | P05177 | 2/20 | 0.33 |
| ▸ | HSD17B10 | Q99714 | 2/20 | 0.33 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.33 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.33 |
| ▸ | TSHR | P16473 | 1/20 | 0.33 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.33 |
| ▸ | TP53 | P04637 | 1/20 | 0.31 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.30 |
| ▸ | SLC6A2 | P23975 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL13714657 | 1.00 | CHRNB2 (0.37) | CHRNB2CHRNA4CHRNB4CHRNA3CHRNA7 | |
| SCHEMBL14509996 | 1.00 | CHRNB2 (0.37) | CHRNB2CHRNA4CHRNB4CHRNA3CHRNA7 | |
| SCHEMBL23383198 | 0.83 | CHRNB2 (0.34) | CHRNB2CHRNA4CHRNB4CHRNA3CHRNA7 | |
| SCHEMBL12271054 | 0.82 | CYP1A2 (0.33) | CHRNB2CHRNA4CHRNB4CHRNA3CHRNA7 | |
| SCHEMBL16866407 | 0.81 | ALDH1A1 (0.34) | CYP1A2MAPK1CYP2C19 | |
| SCHEMBL13608901 | 0.81 | POLB (0.33) | HSD17B10TSHR | |
| SCHEMBL11927954 | 0.80 | — | — | |
| SCHEMBL110267 | 0.79 | MAPK1 (0.35) | CHRM2CHRM3MAPK1 | |
| SCHEMBL12271258 | 0.79 | CA1 (0.35) | — | |
| SCHEMBL15268324 | 0.79 | MAPK1 (0.35) | CHRM2CHRM3MAPK1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 58 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11762287-B2 | Onium salt compound, chemically amplified resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-09-19 | — | — | US | disclosed |
| US-20230205083-A1 | SALT COMPOUND, RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-06-29 | — | — | US | disclosed |
| US-9605101-B2 | Pigment multimer, coloring composition, cured film, color filter, method for manufacturing color filter, solid-state imaging element, and image display device | FUJIFILM CORPORATION (JP) | 2017-03-28 | — | — | US | disclosed |
| US-20160376234-A1 | COLORING CURABLE RESIN COMPOSITION, CURED FILM, COLOR FILTER, METHOD FOR MANUFACTURING COLOR FILTER, SOLID-STATE IMAGING DEVICE, IMAGE DISPLAY DEVICE, COMPOUND, AND CATION | FUJIFILM CORPORATION (JP) | 2016-12-29 | — | — | US | disclosed |
| US-9519079-B2 | Coloring composition, colored pattern, color filter and method of producing the same, pattern forming method, solid-state imaging device, and image display device | FUJIFILM CORPORATION (JP) | 2016-12-13 | — | — | US | disclosed |
| US-9442231-B2 | Colored composition, cured film, color filter, method for producing color filter, solid-state image sensor, and image display device | FUJIFILM CORPORATION (JP) | 2016-09-13 | — | — | US | disclosed |
| US-20160146986-A1 | COLORED COMPOSITION, CURED FILM, COLOR FILTER, METHOD FOR PRODUCING COLOR FILTER, SOLID-STATE IMAGE SENSOR, AND IMAGE DISPLAY DEVICE | FUJIFILM CORPORATION (JP) | 2016-05-26 | — | — | US | disclosed |
| US-20160108161-A1 | PIGMENT MULTIMER, COLORING COMPOSITION, CURED FILM, COLOR FILTER, METHOD FOR MANUFACTURING COLOR FILTER, SOLID-STATE IMAGING ELEMENT, AND IMAGE DISPLAY DEVICE | FUJIFILM CORPORATION (JP) | 2016-04-21 | — | — | US | disclosed |
| US-9291897-B2 | Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, resist film, manufacturing method of electronic device using the same, and electronic device | FUJIFILM CORPORATION (JP) | 2016-03-22 | — | — | US | disclosed |
| US-9268063-B2 | Colored radiation-sensitive composition, colored cured film, color filter, colored pattern forming method, color filter production method, solid-state image sensor, and image display device | FUJIFILM CORPORATION (JP) | 2016-02-23 | — | — | US | disclosed |
| US-7252925-B2 | Nitrogen-containing organic compound, resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2007-08-07 | — | — | US | disclosed |
| US-20070178407-A1 | Polymer, resist protective coating material, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. | 2007-08-02 | — | — | US | disclosed |
| US-7235341-B2 | Positive resist composition | FUJIFILM CORPORATION (JP) | 2007-06-26 | — | — | US | disclosed |
| US-20070141513-A1 | Positive photosensitive composition | FUJI PHOTO FILM CO., LTD. | 2007-06-21 | — | — | US | disclosed |
| US-20070134590-A1 | Resin showing an increase in solubility in alkali developer by action of an acid, a compound being capable of generating an acid when irradiated with an actinic ray or radiation, an acrylic resin with silicon-containing units and being stable to acids but insoluble in alkali developer, solvent | FUJIFILM CORPORATION. (JP) | 2007-06-14 | — | — | US | disclosed |
| US-20070122736-A1 | RESIST PROTECTIVE FILM MATERIAL AND PATTERN FORMATION METHOD | SHIN-ETSU CHEMICAL CO., LTD. | 2007-05-31 | — | — | US | disclosed |
| US-20070122741-A1 | Resist protective coating material and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2007-05-31 | — | — | US | disclosed |
| US-7214465-B2 | Positive photosensitive composition | FUJIFILM CORPORATION (JP) | 2007-05-08 | — | — | US | disclosed |
| US-20070099114-A1 | Polymer, resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2007-05-03 | — | — | US | disclosed |
| US-7192681-B2 | Positive photosensitive composition | FUJI PHOTO FILM CO., LTD. (JP) | 2007-03-20 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (4 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20160108161-A1 | PIGMENT MULTIMER, COLORING COMPOSITION, CURED FILM, COLOR FILTER, METHOD FOR MANUFACTURING COLOR FILTER, SOLID-STATE IMAGING ELEMENT, AND IMAGE DISPLAY DEVICE | CUTA, SLC5A6, SETDB1 | CHRNB2 2900/4885CHRNA4 3063/4885CHRNB4 2623/4885 |
| US-20230205083-A1 | SALT COMPOUND, RESIST COMPOSITION AND PATTERNING PROCESS | SLC6A9, SLC6A5, REN | CHRNB2 4728/4885CHRNA4 4859/4885CHRNB4 4820/4885 |
| US-11762287-B2 | Onium salt compound, chemically amplified resist composition and patterning process | IDUA, SLC6A5, SLC6A9 | CHRNB2 4635/4885CHRNA4 4750/4885CHRNB4 4715/4885 |
| US-20160376234-A1 | COLORING CURABLE RESIN COMPOSITION, CURED FILM, COLOR FILTER, METHOD FOR MANUFACTURING COLOR FILTER, SOLID-STATE IMAGING DEVICE, IMAGE DISPLAY DEVICE, COMPOUND, AND CATION | O60361, WDR12, SEM1 | CHRNB2 575/4885CHRNA4 801/4885CHRNB4 1048/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.