SCHEMBL26853170

SCHEMBL26853170

CCC(C)(C)C(=O)OCc1cc(I)c(O)c(OC)c1

nearest known ligand 0.46

Predicted protein targets (top 4)

geneUniProtsupporting neighboursconfidence
▸ TRPV1 Q8NER1 2/20 0.46
▸ MET P08581 3/20 0.44
▸ APP P05067 1/20 0.40
▸ LMNA P02545 1/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL27255670 0.88 MET (0.47) TRPV1METAPPLMNA
SCHEMBL358269 0.78 TSHR (0.52) METLMNA
SCHEMBL27255664 0.77 THRB (0.41) LMNA
SCHEMBL24106131 0.76 MET (0.46) TRPV1METAPPLMNA
SCHEMBL26853190 0.75 APP (0.39) TRPV1APPLMNA
SCHEMBL16883852 0.75 HSPA5 (0.45) LMNA
SCHEMBL26853182 0.74 APP (0.39) TRPV1APPLMNA
SCHEMBL27255696 0.74 THRB (0.39) METLMNA
SCHEMBL26617184 0.72 TRPV1 (0.52) TRPV1METAPPLMNA
SCHEMBL4728418 0.71 TRPV1 (0.41) TRPV1METAPP

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11822244-B2 Compound, resin, resist composition and method for producing resist pattern SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2023-11-21 — — US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-11822244-B2 Compound, resin, resist composition and method for producing resist pattern RER1, AFF1, AFF4 TRPV1 2858/4885MET 530/4885APP 2604/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.

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