SCHEMBL26859786

SCHEMBL26859786

CC(C)[C@H](C)[C@H](c1ccc(O)cc1)c1ccc(N2C(=O)c3ccc(C(c4ccc5c(c4)C(=O)N(C)C5=O)(C(F)(F)F)C(F)(F)F)cc3C2=O)cc1

nearest known ligand 0.44

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ ESR1 P03372 7/20 0.44
▸ ESR2 Q92731 4/20 0.44
▸ CA9 Q16790 3/20 0.39
▸ CA12 O43570 2/20 0.39
▸ CA1 P00915 2/20 0.39
▸ APP P05067 1/20 0.38
▸ APAF1 O14727 1/20 0.38
▸ POLB P06746 1/20 0.38
▸ BRD4 O60885 1/20 0.38
▸ CA2 P00918 1/20 0.36
▸ MEN1 O00255 2/20 0.36
▸ KMT2A Q03164 2/20 0.36
▸ HTT P42858 1/20 0.36
▸ PKM P14618 1/20 0.36
▸ NR1H3 Q13133 1/20 0.34
▸ ANPEP P15144 1/20 0.34
▸ DPP4 P27487 1/20 0.34
▸ ALDH1A1 P00352 2/20 0.34
▸ NPSR1 Q6W5P4 1/20 0.34
▸ MAPT P10636 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL12352479 0.88 ESR1 (0.56) ESR1ESR2CA9CA12CA1
SCHEMBL25969208 0.82 ESR1 (0.64) ESR1ESR2CA9CA12CA1
SCHEMBL12260131 0.79 ALDH1A1 (0.51) ESR1ESR2CA9CA12CA1
SCHEMBL19823535 0.78 BRD4 (0.40) ESR1CA9CA12CA1POLB
SCHEMBL1960350 0.78 ALDH1A1 (0.50) ESR1ESR2CA9CA12CA1
SCHEMBL12360453 0.77 ESR1 (0.54) ESR1ESR2CA9CA12CA1
SCHEMBL24380215 0.77 ESR1 (0.49) ESR1CA9CA12CA1APP
SCHEMBL1960124 0.75 ALDH1A1 (0.47) ESR1ESR2CA9CA12CA1
SCHEMBL19628661 0.75 ALDH1A1 (0.47) ESR1ESR2CA9CA12CA1
SCHEMBL4549126 0.75 ALDH1A1 (0.47) APPPOLBMEN1KMT2ANR1H3

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-4282895-A1 PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN FILM, PHOTOSENSITIVE DRY FILM, AND PATTERN FORMATION METHOD SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-11-29 — — EP disclosed
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