SCHEMBL26861522

SCHEMBL26861522

C=C(C)C(=O)OC(OCC(=O)OC(C)C(F)(F)F)c1ccc(O)cc1

nearest known ligand 0.33

Predicted protein targets (top 2)

geneUniProtsupporting neighboursconfidence
▸ ESR1 P03372 5/20 0.33
▸ ESR2 Q92731 5/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL26871208 0.89 ESR1 (0.33) ESR1ESR2
SCHEMBL26861520 0.83 ESR1 (0.38) ESR1ESR2
SCHEMBL26862660 0.76 ESR1 (0.39) ESR1ESR2
SCHEMBL26862706 0.73 ESR1 (0.36) ESR1ESR2
SCHEMBL24908561 0.73 ESR1 (0.43) ESR1ESR2
SCHEMBL2608065 0.72 TSHR (0.46) —
SCHEMBL7563914 0.71 PTGS2 (0.47) —
SCHEMBL795471 0.70 TSHR (0.42) —
SCHEMBL26861539 0.70 TSHR (0.40) ESR1ESR2
SCHEMBL26861515 0.70 ESR1 (0.36) ESR1ESR2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230375925-A1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMING METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, COMPOUND, AND RESIN FUJIFILM CORPORATION (JP) 2023-11-23 — — US disclosed
US-20230375925-A1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMING METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, COMPOUND, AND RESIN FUJIFILM CORPORATION (JP) 2023-11-23 — — US disclosed
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