Predicted protein targets (top 13)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ESR1 | P03372 | 5/20 | 0.36 |
| ▸ | ESR2 | Q92731 | 5/20 | 0.36 |
| ▸ | TSHR | P16473 | 1/20 | 0.33 |
| ▸ | TYR | P14679 | 1/20 | 0.32 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.31 |
| ▸ | ADRB2 | P07550 | 1/20 | 0.30 |
| ▸ | ADRB1 | P08588 | 1/20 | 0.30 |
| ▸ | ADRB3 | P13945 | 1/20 | 0.30 |
| ▸ | POLB | P06746 | 1/20 | 0.30 |
| ▸ | APEX1 | P27695 | 1/20 | 0.30 |
| ▸ | HTT | P42858 | 1/20 | 0.30 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.30 |
| ▸ | DEGS1 | O15121 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL24908561 | 0.85 | ESR1 (0.43) | ESR1ESR2TDP1DEGS1 | |
| SCHEMBL18372593 | 0.84 | ESR1 (0.40) | ESR1ESR2TSHRTYRPOLB | |
| SCHEMBL26861539 | 0.81 | TSHR (0.40) | ESR1ESR2TSHRTYR | |
| SCHEMBL26862766 | 0.80 | HSD17B1 (0.33) | — | |
| SCHEMBL25765230 | 0.76 | ESR1 (0.46) | ESR1ESR2TDP1DEGS1 | |
| SCHEMBL26816175 | 0.74 | ALDH1A1 (0.40) | TSHR | |
| SCHEMBL2611541 | 0.74 | TSHR (0.43) | TSHR | |
| SCHEMBL26871208 | 0.74 | ESR1 (0.33) | ESR1ESR2 | |
| SCHEMBL26861522 | 0.73 | ESR1 (0.33) | ESR1ESR2 | |
| SCHEMBL2608065 | 0.73 | TSHR (0.46) | TSHR |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20230375925-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMING METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, COMPOUND, AND RESIN | FUJIFILM CORPORATION (JP) | 2023-11-23 | — | — | US | disclosed |