SCHEMBL26862708

SCHEMBL26862708

C=C(C)C(=O)OC(c1ccc(OC)cc1)C(F)(F)F

nearest known ligand 0.45

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ MAPT P10636 2/20 0.45
▸ NPSR1 Q6W5P4 2/20 0.40
▸ RAB9A P51151 2/20 0.40
▸ NPC1 O15118 1/20 0.40
▸ PAX8 Q06710 1/20 0.40
▸ GABBR2 O75899 1/20 0.38
▸ GABBR1 Q9UBS5 1/20 0.38
▸ MEN1 O00255 2/20 0.37
▸ KMT2A Q03164 2/20 0.37
▸ L3MBTL1 Q9Y468 2/20 0.37
▸ ACACB O00763 1/20 0.37
▸ ALDH1A1 P00352 1/20 0.37
▸ TSHR P16473 1/20 0.37
▸ MAPK1 P28482 1/20 0.37
▸ TDP1 Q9NUW8 1/20 0.37
▸ CES2 O00748 1/20 0.36
▸ CES1 P23141 1/20 0.36
▸ HSD17B2 P37059 1/20 0.36
▸ CA1 P00915 1/20 0.36
▸ CA2 P00918 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL26871312 0.86 ACACB (0.41) MAPTNPSR1MEN1KMT2AACACB
SCHEMBL24908561 0.85 ESR1 (0.43) MAPTTDP1CA1CA2
SCHEMBL5091135 0.83 HPGD (0.41) NPSR1KMT2AL3MBTL1ALDH1A1MAPK1
SCHEMBL21231953 0.82 MAPT (0.42) MAPTNPSR1RAB9ANPC1PAX8
SCHEMBL14648180 0.81 MAPT (0.53) MAPTNPSR1RAB9ANPC1PAX8
SCHEMBL26862711 0.80 LMNA (0.41) MAPTRAB9AMEN1KMT2AALDH1A1
SCHEMBL24908563 0.80 TSHR (0.48) NPSR1RAB9AMEN1KMT2ATSHR
SCHEMBL7188608 0.78 MAPT (0.50) MAPTNPSR1RAB9ANPC1PAX8
SCHEMBL26862498 0.78 CA12 (0.36) MAPTMEN1KMT2AALDH1A1TSHR
SCHEMBL14648268 0.78 HPGD (0.50) MAPTNPSR1RAB9ANPC1PAX8

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230375925-A1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMING METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, COMPOUND, AND RESIN FUJIFILM CORPORATION (JP) 2023-11-23 — — US disclosed
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