SCHEMBL2686734

SCHEMBL2686734

CCCCC(CC)C[Si](Cl)(Cl)Cl

nearest known ligand 0.50

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 4/20 0.50
TDP1 Q9NUW8 2/20 0.50
CYP3A4 P08684 4/20 0.48
TSHR P16473 4/20 0.48
L3MBTL1 Q9Y468 1/20 0.45
CA2 P00918 4/20 0.41
ATM Q13315 1/20 0.37
LMNA P02545 1/20 0.34
CHRM2 P08172 1/20 0.34
HTR1A P08908 1/20 0.34
ADRA2A P08913 1/20 0.34
ADORA3 P0DMS8 1/20 0.34
CHRM1 P11229 1/20 0.34
SLC6A2 P23975 1/20 0.34
SLC6A4 P31645 1/20 0.34
OPRM1 P35372 1/20 0.34
DRD3 P35462 1/20 0.34
SLC6A3 Q01959 1/20 0.34
KCNH2 Q12809 1/20 0.34
CYP2D6 P10635 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2869579 0.91 LMNA (0.46) ALDH1A1TDP1CYP3A4TSHRL3MBTL1
SCHEMBL29001284 0.91 LMNA (0.46) ALDH1A1TDP1CYP3A4TSHRL3MBTL1
SCHEMBL132156 0.86 ALDH1A1 (0.50) ALDH1A1TDP1CYP3A4TSHRL3MBTL1
SCHEMBL22555588 0.84 ALDH1A1 (0.48) ALDH1A1TDP1CYP3A4TSHRL3MBTL1
SCHEMBL4937119 0.81 LMNA (0.50) ALDH1A1TSHRLMNAOPRM1FDPS
SCHEMBL6332954 0.81 LMNA (0.50) ALDH1A1TSHRLMNAOPRM1FDPS
SCHEMBL8342910 0.81 LMNA (0.50) ALDH1A1TSHRLMNAOPRM1FDPS
SCHEMBL14760005 0.81 LMNA (0.50) ALDH1A1TSHRLMNAOPRM1FDPS
SCHEMBL9703821 0.80 ALDH1A1 (0.54) ALDH1A1TDP1CYP3A4TSHRL3MBTL1
SCHEMBL7568798 0.79 ALDH1A1 (0.43) ALDH1A1TDP1CYP3A4TSHRL3MBTL1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 50 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-4228092-A BY ALCOHOL ESTERIFICATION DYNAMIT NOBEL AKTIENGESELLSCHAFT (DE) 1980-10-14 US claimed
CN-122094989-A Polymer, water repellent, fiber product and method for producing fiber product 2026-05-26 CN disclosed
EP-4663716-A1 WATER REPELLENT COMPOSITION Daikin Industries, Ltd. (JP) 2025-12-17 EP disclosed
EP-4617341-A1 WATER REPELLENT COMPOSITION Daikin Industries, Ltd. (JP) 2025-09-17 EP disclosed
EP-4600323-A1 WATER REPELLENT COMPOSITION DAIKIN INDUSTRIES, LTD. (JP) 2025-08-13 EP disclosed
WO-2025095111-A1 POLYMER, WATER REPELLENT AGENT, FIBER PRODUCT, AND METHOD FOR PRODUCING FIBER PRODUCT ダイキン工業株式会社 2025-05-08 WO disclosed
WO-2025095118-A1 POLYMER, WATER REPELLENT AGENT, FIBER PRODUCT, AND METHOD FOR PRODUCING FIBER PRODUCT ダイキン工業株式会社 2025-05-08 WO disclosed
WO-2025095113-A1 POLYMER, WATER REPELLENT, TEXTILE PRODUCT, AND METHOD FOR MANUFACTURING TEXTILE PRODUCT ダイキン工業株式会社 2025-05-08 WO disclosed
WO-2025047963-A1 WATER REPELLENT COMPOSITION ダイキン工業株式会社 2025-03-06 WO disclosed
WO-2025047961-A1 WATER REPELLENT COMPOSITION ダイキン工業株式会社 2025-03-06 WO disclosed
US-20150028265-A1 CONJUGATED POLYMERS FOR ELECTRONIC DEVICES THE REGENTS OF THE UNIVERSITY OF CALIFORNIA 2015-01-29 US disclosed
CN-102498117-A Organic Chlorosilane And Method For Preparing Same SAMSUNG FINE CHEMICALS CO LTD 2012-06-13 CN disclosed
US-20120114544-A1 ORGANIC CHLOROHYDROSILANE AND METHOD FOR PREPARING THEM SAMSUNG FINE CHEMICALS CO., LTD (KR) 2012-05-10 US disclosed
CN-100381526-C Composition for forming porous film, porous film and method for forming the same, interlevel insulator film and semiconductor device SHINETSU CHEMICAL CO (JP) 2008-04-16 CN disclosed
US-7332446-B2 Composition for forming porous film, porous film and method for forming the same, interlevel insulator film and semiconductor device SHIN-ETSU CHEMICAL CO., LTD. (JP) 2008-02-19 US disclosed
CN-1542071-A Composition for forming porous film, porous film and method for forming the same, interlevel insulator film and semiconductor device ��Խ��ѧ��ҵ��ʽ���� 2004-11-03 CN disclosed
US-20040188809-A1 Composition for forming porous film, porous film and method for forming the same, interlevel insulator film and semiconductor device SHIN-ETSU CHEMICAL CO., LTD. 2004-09-30 US disclosed
US-6182759-B1 IMPROVING GAS FLOW IN WATER-CONTAINING NATURAL GAS WELLS AND NATURAL GAS STORAGE WELLS BY INJECTING A HOMOGENEOUS PHASE COMPRISING A WATER-REPELLENT, SOLVOLYSIS-RESISTANT ORGANOSILICON COMPOUND INTO THE WATER BEARING ROCK WACKER-CHEMIE GMBH (DE) 2001-02-06 US disclosed
US-4835014-A WATER, SILICONE WACKER-CHEMIE GMBH (DE) 1989-05-30 US disclosed
US-4228092-A BY ALCOHOL ESTERIFICATION DYNAMIT NOBEL AKTIENGESELLSCHAFT (DE) 1980-10-14 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20150028265-A1 CONJUGATED POLYMERS FOR ELECTRONIC DEVICES EED, EPCAM, GABRE ALDH1A1 528/4885TDP1 1564/4885CYP3A4 1926/4885
US-20120114544-A1 ORGANIC CHLOROHYDROSILANE AND METHOD FOR PREPARING THEM PHPT1, SIK1, SIK2 ALDH1A1 4436/4885TDP1 3689/4885CYP3A4 3614/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.