Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ACMSD | Q8TDX5 | 2/20 | 0.57 |
| ▸ | BACE1 | P56817 | 2/20 | 0.47 |
| ▸ | HDAC2 | Q92769 | 3/20 | 0.47 |
| ▸ | HDAC4 | P56524 | 1/20 | 0.47 |
| ▸ | HDAC8 | Q9BY41 | 1/20 | 0.47 |
| ▸ | QDPR | P09417 | 3/20 | 0.46 |
| ▸ | NOS3 | P29474 | 2/20 | 0.43 |
| ▸ | NOS1 | P29475 | 2/20 | 0.43 |
| ▸ | NOS2 | P35228 | 2/20 | 0.43 |
| ▸ | NUDT1 | P36639 | 1/20 | 0.42 |
| ▸ | KMO | O15229 | 1/20 | 0.42 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.41 |
| ▸ | ALOX15 | P16050 | 2/20 | 0.41 |
| ▸ | HSD17B10 | Q99714 | 2/20 | 0.41 |
| ▸ | HPGD | P15428 | 1/20 | 0.41 |
| ▸ | ALOX12 | P18054 | 1/20 | 0.41 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.41 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.41 |
| ▸ | HDAC1 | Q13547 | 2/20 | 0.40 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.40 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL28096625 | 1.00 | ACMSD (0.57) | ACMSDBACE1HDAC2HDAC4HDAC8 | |
| SCHEMBL10536451 | 0.98 | ACMSD (0.56) | ACMSDBACE1HDAC2HDAC4HDAC8 | |
| SCHEMBL3985023 | 0.82 | BACE1 (0.51) | ACMSDBACE1HDAC2NOS3NOS1 | |
| SCHEMBL68815 | 0.82 | QDPR (0.66) | ACMSDBACE1HDAC2HDAC4HDAC8 | |
| SCHEMBL7932026 | 0.80 | ACMSD (0.61) | ACMSDBACE1HDAC2HDAC4HDAC8 | |
| SCHEMBL1291751 | 0.79 | QDPR (0.68) | ACMSDBACE1HDAC2HDAC4HDAC8 | |
| SCHEMBL15156130 | 0.79 | BACE1 (0.49) | ACMSDBACE1HDAC2HDAC4HDAC8 | |
| SCHEMBL7561294 | 0.79 | ACMSD (0.56) | ACMSDBACE1HDAC2HDAC4HDAC8 | |
| SCHEMBL5289225 | 0.78 | BACE1 (0.49) | ACMSDBACE1HDAC2HDAC4HDAC8 | |
| SCHEMBL19665789 | 0.78 | ACMSD (0.59) | ACMSDBACE1HDAC2HDAC4HDAC8 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 35 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-118909227-A | Phenol-containing amine adduct and preparation method thereof | 江苏富琪森新材料有限公司 | 2024-11-08 | — | — | CN | claimed |
| CN-102766009-A | Sulfonated phenols with nitrophenols as polymerization inhibitors | CHEMTURA CORP | 2012-11-07 | — | — | CN | claimed |
| CN-100564332-C | Sulfonated nitrophenols as polymerization inhibitors | CHEMTURA CORP (US) | 2009-12-02 | — | — | CN | claimed |
| CN-101102984-A | Aromatic sulfonic acids, amines, and nitrophenols in combination with nitroxyl radical-containing compounds or C-nitrsoanilines as polymerization inhibitors | CHEMTURA CORP (US) | 2008-01-09 | — | — | CN | claimed |
| CN-101044106-A | Sulfonated phenols and nitrophenols as polymerization inhibitors | CHEMTURA CORP (US) | 2007-09-26 | — | — | CN | claimed |
| CN-101031528-A | Sulfonated nitrophenols as polymerization inhibitors | CHEMTURA CORP (US) | 2007-09-05 | — | — | CN | claimed |
| CN-118909227-A | Phenol-containing amine adduct and preparation method thereof | 江苏富琪森新材料有限公司 | 2024-11-08 | — | — | CN | disclosed |
| CN-113820920-B | Photosensitive resin composition, method for producing cured relief pattern, and semiconductor device | 旭化成株式会社 | 2023-07-04 | — | — | CN | disclosed |
| CN-113820920-A | Photosensitive resin composition, method for producing cured relief pattern, and semiconductor device | 旭化成株式会社 | 2021-12-21 | — | — | CN | disclosed |
| CN-107850844-B | Photosensitive resin composition, method for producing cured relief pattern, and semiconductor device | 旭化成株式会社 | 2021-09-07 | — | — | CN | disclosed |
| CN-107266857-B | Thermosetting resin composition | 旭化成株式会社 | 2020-04-14 | — | — | CN | disclosed |
| US-8829035-B2 | Agent for treatment or prevention of diseases associated with activity of neurotrophic factors | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2014-09-09 | — | — | US | disclosed |
| EP-2436683-B1 | AGENT FOR TREATMENT OR PREVENTION OF DISEASES ASSOCIATED WITH ACTIVITY OF NEUROTROPHIC FACTORS | SUMITOMO CHEMICAL CO (JP) | 2014-05-14 | — | — | EP | disclosed |
| US-5093504-A | PRODUCTION OF THIOPHENE-2,5-DICARBOXYLIC ACID DIESTERS, TETRAHYDROTHIOPHENE-2,5-DICARBOXYLIC ACID DIESTERS AND DIBENZOXAZOLYLTHIOPHENES | SUMITOMO SEIKA CHEMICALS, CO., LTD. (JP) | 1992-03-03 | — | — | US | disclosed |
| EP-0387725-A2 | Production of thiophene-2,5-dicarboxylic acid diesters and tetrahydrothiophene-2,5-dicarboxylic acid diesters | SUMITOMO SEIKA CHEMICALS CO., LTD. (JP) | 1990-09-19 | — | — | EP | disclosed |
| US-4859661-A | Alkyl-substituted benzoxazinorifamycin derivative, process for preparing the same and antibacterial agent containing the same | KANEGAFUCHI KAGAKU KOGYO KABUSHIKI KAISHA (JP) | 1989-08-22 | — | — | US | disclosed |
| CN-87104870-A | Benzoxazinnorifamyciderivative derivative, its preparation method that alkyl replaces and contain the antiseptic-germicide of this derivative | — | 1988-02-17 | — | — | CN | disclosed |
| EP-0253340-A1 | Alkyl-substituted benzoxazinorifamycin derivative, process for preparing the same and antibacterial agent containing the same | KANEGAFUCHI KAGAKU KOGYO KABUSHIKI KAISHA (JP) | 1988-01-20 | — | — | EP | disclosed |
| US-4119634-A | BRIGHTENERS FOR PLASTICS AND POLYESTERS | BAYER AKTIENGESELLSCHAFT (DE) | 1978-10-10 | — | — | US | disclosed |
| US-3985763-A | DYESTUFFS | BAYER AKTIENGESELLSCHAFT (DT) | 1976-10-12 | — | — | US | disclosed |