SCHEMBL2690448

SCHEMBL2690448

CCCCCCC(=O)OCC(F)(F)F

nearest known ligand 0.62

Predicted protein targets (top 16)

geneUniProtsupporting neighboursconfidence
DGKA P23743 1/20 0.62
PAM P19021 2/20 0.56
TSHR P16473 1/20 0.53
MAPT P10636 1/20 0.53
FAAH O00519 7/20 0.52
CES1 P23141 5/20 0.52
CES2 O00748 2/20 0.52
MEN1 O00255 2/20 0.52
KMT2A Q03164 2/20 0.52
CYP1A2 P05177 1/20 0.52
HSD17B10 Q99714 1/20 0.52
DNM1 Q05193 1/20 0.51
ALDH1A1 P00352 1/20 0.51
LMNA P02545 1/20 0.51
KDM4E B2RXH2 1/20 0.50
DUSP3 P51452 1/20 0.50

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL835850 1.00 DGKA (0.62) DGKAPAMTSHRMAPTFAAH
SCHEMBL2690121 1.00 DGKA (0.62) DGKAPAMTSHRMAPTFAAH
SCHEMBL6509263 1.00 DGKA (0.62) DGKAPAMTSHRMAPTFAAH
SCHEMBL21257687 1.00 DGKA (0.62) DGKAPAMTSHRMAPTFAAH
SCHEMBL21257703 1.00 DGKA (0.62) DGKAPAMTSHRMAPTFAAH
SCHEMBL2692664 0.98 DGKA (0.59) DGKAPAMTSHRMAPTFAAH
SCHEMBL2691702 0.92 DGKA (0.50) DGKAPAMTSHRMAPTFAAH
SCHEMBL540976 0.90 FAAH (0.59) DGKAMAPTFAAHCES1KMT2A
SCHEMBL540898 0.90 FAAH (0.59) DGKAMAPTFAAHCES1KMT2A
SCHEMBL6297122 0.90 HTT (0.48) DGKAPAMTSHRMAPTFAAH

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-4318629-A1 PRIMER FOR POWER STORAGE DEVICE ELECTRODES, COMPOSITION FOR FORMING PRIMER LAYER, ELECTRODE FOR POWER STORAGE DEVICES, AND SECONDARY BATTERY AGC INC. (JP) 2024-02-07 EP disclosed
US-20230420686-A1 PRIMER FOR POWER STORAGE DEVICE ELECTRODE, COMPOSITION FOR FORMING PRIMER LAYER, ELECTRODE FOR POWER STORAGE DEVICE, AND SECONDARY BATTERY AGC Inc. (JP) 2023-12-28 US disclosed
CN-108707057-B Aliphatic trifluoroethyl ester compound and preparation method thereof 江西师范大学 2022-02-01 CN disclosed
EP-2450406-B1 FLUORINE-CONTAINING COPOLYMER COMPOSITION AND METHOD FOR PRODUCING SAME ASAHI GLASS CO LTD (JP) 2015-10-14 EP disclosed
EP-2450406-A1 FLUORINE-CONTAINING COPOLYMER COMPOSITION AND METHOD FOR PRODUCING SAME Asahi Glass Company, Limited (JP) 2012-05-09 EP disclosed
US-20120108723-A1 FLUOROCOPOLYMER COMPOSITION AND ITS PRODUCTION PROCESS ASAHI GLASS COMPANY, LIMITED (JP) 2012-05-03 US disclosed