SCHEMBL2690731

SCHEMBL2690731

C=COCCC(C)OC(=O)C(=C)C

nearest known ligand 0.39

Predicted protein targets (top 3)

geneUniProtsupporting neighboursconfidence
TSHR P16473 3/20 0.39
ALDH1A1 P00352 1/20 0.33
THRB P10828 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3411386 0.84 TSHR (0.42) TSHRALDH1A1THRB
SCHEMBL1393188 0.82 TSHR (0.46) TSHRALDH1A1THRB
SCHEMBL12804553 0.82 TSHR (0.40) TSHRALDH1A1THRB
SCHEMBL1392533 0.81 TSHR (0.38) TSHRALDH1A1THRB
SCHEMBL2540758 0.81 TSHR (0.50) TSHRALDH1A1THRB
SCHEMBL28053779 0.81 TSHR (0.42) TSHRALDH1A1THRB
SCHEMBL12804352 0.81 TSHR (0.39) TSHRALDH1A1THRB
SCHEMBL24963 0.80 TSHR (0.52) TSHRALDH1A1THRB
SCHEMBL4593744 0.79 THRB (0.52) TSHRALDH1A1THRB
SCHEMBL3136846 0.79 TSHR (0.41) TSHRALDH1A1THRB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 28 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11987715-B2 Radiation curable ink jet composition and ink jet method SEIKO EPSON CORPORATION (JP) 2024-05-21 US disclosed
US-20240052185-A1 Radiation Curable Ink Jet Composition And Ink Jet Method SEIKO EPSON CORP (JP) 2024-02-15 US disclosed
US-11884828-B2 Radiation curable ink jet composition and ink jet method SEIKO EPSON CORPORATION 2024-01-30 US disclosed
EP-3885413-B1 RADIATION CURABLE INK JET COMPOSITION AND INK JET METHOD SEIKO EPSON CORP (JP) 2023-09-27 EP disclosed
US-20210301158-A1 Radiation Curable Ink Jet Composition And Ink Jet Method SEIKO EPSON CORPORATION (JP) 2021-09-30 US disclosed
US-20210301162-A1 Radiation Curable Ink Jet Composition And Ink Jet Method SEIKO EPSON CORPORATION (JP) 2021-09-30 US disclosed
EP-3885413-A1 RADIATION CURABLE INK JET COMPOSITION AND INK JET METHOD Seiko Epson Corporation (JP) 2021-09-29 EP disclosed
US-20200262205-A1 RECORDING DEVICE AND MAINTENANCE METHOD FOR RECORDING DEVICE SEIKO EPSON CORPORATION (JP) 2020-08-20 US disclosed
EP-2657037-B1 Printing apparatus and printing method SEIKO EPSON CORP (JP) 2020-03-25 EP disclosed
US-10308824-B2 Radiation curable ink jet composition and ink jet recording method SEIKO EPSON CORPORATION (JP) 2019-06-04 US disclosed
US-20150259549-A1 ULTRAVIOLET CURABLE COMPOSITION AND STORAGE BODY SEIKO EPSON CORPORATION (JP) 2015-09-17 US disclosed
US-20150240094-A1 ULTRAVIOLET CURABLE TYPE INK-JET INK COMPOSITION, RECORDING METHOD AND RECORDING APPARATUS USING THE SAME SEIKO EPSON CORP (JP) 2015-08-27 US disclosed
US-9056986-B2 Ultraviolet curable type ink-jet ink composition, recording method and recording apparatus using same SEIKO EPSON CORPORATION (JP) 2015-06-16 US disclosed
US-20150087741-A1 PHOTO-CURING AND STRIPPABLE ADHESIVE COMPOSITION AND USES THEREOF CHI MEI CORPORATION (TW) 2015-03-26 US disclosed
US-8876274-B2 Pattern forming method SEIKO EPSON CORPORATION (JP) 2014-11-04 US disclosed
US-20140292928-A1 PRINTING APPARATUS SEIKO EPSON CORPORATION (JP) 2014-10-02 US disclosed
US-20130286085-A1 PRINTING APPARATUS AND PRINTING METHOD SEIKO EPSON CORPORATION (JP) 2013-10-31 US disclosed
EP-2657037-A1 Printing apparatus and printing method Seiko Epson Corporation (JP) 2013-10-30 EP disclosed
US-20120249664-A1 PATTERN FORMING METHOD SEIKO EPSON CORPORATION (JP) 2012-10-04 US disclosed
US-20120113201-A1 ULTRAVIOLET CURABLE TYPE INK-JET INK COMPOSITION, RECORDING METHOD AND RECORDING APPARATUS USISNG SAME SEIKO EPSON CORPORATION (JP) 2012-05-10 US disclosed