SCHEMBL2697773

SCHEMBL2697773

CCCC[Sn](CCCC)(Oc1ccccc1C)O[Sn](CCCC)(CCCC)Oc1ccccc1C

nearest known ligand 0.43

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CYP1A2 P05177 5/20 0.36
CYP2C19 P33261 2/20 0.36
CYP2C9 P11712 1/20 0.36
PTGS2 P35354 1/20 0.35
TDP1 Q9NUW8 1/20 0.35
TSHR P16473 3/20 0.34
KMT2A Q03164 2/20 0.34
MEN1 O00255 1/20 0.34
NPC1 O15118 1/20 0.34
RAB9A P51151 1/20 0.34
SMN1; SMN2 Q16637 1/20 0.34
CYP2D6 P10635 4/20 0.34
ALDH1A1 P00352 1/20 0.34
GLA P06280 1/20 0.34
SLC6A2 P23975 4/20 0.33
SLC6A4 P31645 4/20 0.33
SLC6A3 Q01959 4/20 0.33
GAA P10253 1/20 0.33
MAPT P10636 1/20 0.33
PKM P14618 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2696899 0.93 KMT2A (0.35) CYP1A2CYP2C19CYP2C9PTGS2TDP1
SCHEMBL2694795 0.93 CYP1A2 (0.38) CYP1A2CYP2C19CYP2C9PTGS2TDP1
SCHEMBL2698154 0.87 HTR1B (0.41) TSHRKMT2AMEN1SMN1; SMN2ALDH1A1
SCHEMBL2696410 0.86 MEN1 (0.36) CYP1A2CYP2C19CYP2C9PTGS2TDP1
SCHEMBL2697068 0.84 KDM4E (0.31) KDM4E
SCHEMBL2696396 0.84 APLNR (0.34) PTGS2TSHRKMT2AMEN1SMN1; SMN2
SCHEMBL2696836 0.83 TSHR (0.35) PTGS2TSHRKDM4E
SCHEMBL2694744 0.83 ALOX5 (0.37) PTGS2TSHRKMT2AMEN1SMN1; SMN2
SCHEMBL2694896 0.81 L3MBTL1 (0.41) CYP1A2CYP2C19CYP2C9PTGS2KMT2A
SCHEMBL2697757 0.81 HTR1B (0.40) TSHRKMT2AMEN1SMN1; SMN2ALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8168812-B2 Process for producing alkyl tin alkoxide compound and process for producing carbonic acid ester using said compound ASAHI KASEI CHEMICALS CORPORATION (JP) 2012-05-01 US disclosed