⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL5480949 | 0.79 | — | — | |
| SCHEMBL9099559 | 0.76 | — | — | |
| SCHEMBL1180970 | 0.74 | — | — | |
| SCHEMBL1180140 | 0.74 | — | — | |
| SCHEMBL1854469 | 0.74 | — | — | |
| SCHEMBL15415943 | 0.69 | GABRA1 (0.32) | — | |
| SCHEMBL3430889 | 0.69 | — | — | |
| SCHEMBL2067217 | 0.65 | XDH (0.37) | — | |
| SCHEMBL49656 | 0.61 | — | — | |
| SCHEMBL8937625 | 0.61 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 119 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-110713588-B | Hardmask composition, hardmask layer and method of forming pattern | 三星SDI株式会社 | 2022-08-09 | — | — | CN | claimed |
| CN-110713588-A | Hardmask composition, hardmask layer and method of forming pattern | 三星SDI株式会社 | 2020-01-21 | — | — | CN | claimed |
| US-9732227-B2 | Modified colorants and inkjet ink compositions comprising modified colorants | CABOT CORPORATION (US) | 2017-08-15 | — | — | US | claimed |
| US-20160075880-A1 | Modified Colorants and Inkjet Ink Compositions Comprising Modified Colorants | CABOT CORPORATION | 2016-03-17 | — | — | US | claimed |
| JP-2009515007-A | — | — | 2009-04-09 | — | — | JP | claimed |
| JP-2009513802-A | — | — | 2009-04-02 | — | — | JP | claimed |
| EP-1951821-A2 | MODIFIED COLORANTS AND INKJET INK COMPOSITIONS COMPRISING MODIFIED COLORANTS | Cabot Corporation (US) | 2008-08-06 | — | — | EP | claimed |
| EP-1951819-A2 | MODIFIED COLORANTS AND INKJET INK COMPOSITIONS COMPRISING MODIFIED COLORANTS | Cabot Corporation (US) | 2008-08-06 | — | — | EP | claimed |
| WO-2007053563-A2 | MODIFIED COLORANTS AND INKJET INK COMPOSITIONS COMPRISING MODIFIED COLORANTS | CABOT CORPORATION (US) | 2007-05-10 | — | — | WO | claimed |
| WO-2007053564-A2 | MODIFIED COLORANTS AND INKJET INK COMPOSITIONS COMPRISING MODIFIED COLORANTS | CABOT CORPORATION (US) | 2007-05-10 | — | — | WO | claimed |
| US-20070100024-A1 | Modified colorants and inkjet ink compositions comprising modified colorants | CABOT CORPORATION | 2007-05-03 | — | — | US | claimed |
| US-20070100023-A1 | Modified colorants and inkjet ink compositions comprising modified colorants | CABOT CORPORATION | 2007-05-03 | — | — | US | claimed |
| EP-0416410-B1 | Piperaziniocephalosporins | SHIONOGI & CO (JP) | 1994-11-30 | — | — | EP | claimed |
| US-5143910-A | PIPERAZINIOCEPHALOSPORINS | SHIONOGI & CO., LTD. (JP) | 1992-09-01 | — | — | US | claimed |
| EP-0416410-A1 | Piperaziniocephalosporins | SHIONOGI SEIYAKU KABUSHIKI KAISHA (JP) | 1991-03-13 | — | — | EP | claimed |
| EP-0136266-A2 | 7-Beta-acylamido-3-cephem-4-carboxylic-acid esters, process for their preparation, pharmaceutical compositions and their application | CIBA-GEIGY AG (CH) | 1985-04-03 | — | — | EP | claimed |
| EP-3294813-B1 | AMPHOTERIC POLYMERS AND USE IN INKJET INK COMPOSITIONS | CABOT CORP (US) | 2024-06-12 | — | — | EP | disclosed |
| CN-110713588-B | Hardmask composition, hardmask layer and method of forming pattern | 三星SDI株式会社 | 2022-08-09 | — | — | CN | disclosed |
| EP-0416410-A1 | Piperaziniocephalosporins | SHIONOGI SEIYAKU KABUSHIKI KAISHA (JP) | 1991-03-13 | — | — | EP | disclosed |
| EP-0136266-A2 | 7-Beta-acylamido-3-cephem-4-carboxylic-acid esters, process for their preparation, pharmaceutical compositions and their application | CIBA-GEIGY AG (CH) | 1985-04-03 | — | — | EP | disclosed |