SCHEMBL270330

SCHEMBL270330

CCC(C)C(O)CO

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13536696 1.00
SCHEMBL8533179 0.82 TSHR (0.40)
SCHEMBL18951998 0.82 LMNA (0.53)
SCHEMBL14357523 0.80 LMNA (0.58)
SCHEMBL27956275 0.80 TSHR (0.38)
SCHEMBL2386043 0.80
SCHEMBL14257264 0.80
SCHEMBL12264068 0.80
SCHEMBL14928532 0.80
SCHEMBL428351 0.80

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 551 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-116948157-A Low-temperature-cured high-leveling polyester resin and preparation method and application thereof 擎天材料科技有限公司 2023-10-27 CN claimed
CN-114514339-A Composition for copper bump electrodeposition comprising leveling agent 巴斯夫欧洲公司 2022-05-17 CN claimed
CN-114450438-A Composition for copper bump electrodeposition comprising leveling agent 巴斯夫欧洲公司 2022-05-06 CN claimed
WO-2017134653-A1 CARBON NANOTUBES FABRIC AS ELECTRODE CURRENT COLLECTOR IN LI-ION BATTERY TECHNION RESEARCH & DEVELOPMENT FOUNDATION LIMITED (IL) 2017-08-10 WO claimed
US-7928152-B2 Electrodeposition paint KANSAI PAINT CO., LTD. (JP) 2011-04-19 US claimed
US-20080020306-A1 ELECTROPHOTOGRAPHIC PHOTORECEPTOR XEROX CORPORATION (US) 2008-01-24 US claimed
US-6761973-B2 CATIONIC RESIN AND A POLYISOCYANATE BLOCKED WITH A BLOCKING AGENT CONTAINING A SPECIFIC DIOL KANSAI PAINT CO., LTD. (JP) 2004-07-13 US claimed
US-20030158348-A1 Cationic resin composition KANSAI PAINT CO., LTD. (JP) 2003-08-21 US claimed
CN-1110541-C Concentrated water-dispersible stable fiber softener compositions PROCTER & GAMBLE (US) 2003-06-04 CN claimed
CN-1219953-A Fabric softening compound/composition PROCTER & GAMBLE (US) 1999-06-16 CN claimed
CN-1196081-A Concentrated, water dispersible, stable, fabric softening compositions PROCTER & GAMBLE (US) 1998-10-14 CN claimed
CN-1195369-A Concentrated and stable fabric softening compositions PROCTER & GAMBLE (US) 1998-10-07 CN claimed
US-12637804-B2 Ink jet recording method SEIKO EPSON CORPORATION (JP) 2026-05-26 US disclosed
EP-4744895-A1 LAMINATE FOR THERMOFORMING MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2026-05-20 EP disclosed
US-12629792-B2 Polishing pad and method for producing polished product FUJIBO HOLDINGS, INC. (JP) 2026-05-19 US disclosed
US-20260131522-A1 LAMINATE FOR THERMOFORMING, MOLDED ARTICLE USING SAME, AND METHOD FOR PRODUCING MOLDED ARTICLE MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2026-05-14 US disclosed
EP-0049565-A2 Derivatives of substituted N-alkylimidazoles, their preparation and pharmaceutical compositions containing them SYNTEX (U.S.A.) INC. (US) 1982-04-14 EP disclosed
US-4321272-A Derivatives of substituted N-alkylimidazoles SYNTEX (U.S.A.) INC. (US) 1982-03-23 US disclosed
US-4229262-A EXTRACTIVE DISTILLATION UNION CARBIDE CORPORATION (US) 1980-10-21 US disclosed
US-4153516-A SOLVENT EXTRACTION WITH AN ALCOHOL SOLVENT UNION CARBIDE CORPORATION (US) 1979-05-08 US disclosed