SCHEMBL27046925

SCHEMBL27046925

C[C@]12C=CC(=O)C=C1CCC1[C@@H]2CC[C@@]2(C)[C@H]1CC[C@]2(C)C1CCC1

nearest known ligand 0.72

Predicted protein targets (top 13)

geneUniProtsupporting neighboursconfidence
▸ LMNA P02545 3/20 0.72
▸ MAPT P10636 2/20 0.72
▸ CYP19A1 P11511 12/20 0.66
▸ CYP3A4 P08684 1/20 0.64
▸ HSD17B10 Q99714 3/20 0.50
▸ MEN1 O00255 1/20 0.50
▸ ALDH1A1 P00352 1/20 0.50
▸ NR3C1 P04150 1/20 0.50
▸ PGR P06401 1/20 0.50
▸ KMT2A Q03164 1/20 0.50
▸ HIF1A Q16665 1/20 0.50
▸ SLC29A1 Q99808 1/20 0.50
▸ TDP1 Q9NUW8 1/20 0.50

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL27046927 0.97 LMNA (0.72) LMNAMAPTCYP19A1CYP3A4HSD17B10
SCHEMBL27046922 0.95 LMNA (0.75) LMNAMAPTCYP19A1CYP3A4HSD17B10
SCHEMBL17775770 0.86 LMNA (0.77) LMNAMAPTCYP19A1CYP3A4
SCHEMBL10861103 0.84 LMNA (0.81) LMNAMAPTCYP19A1CYP3A4HSD17B10
Methandrostenolone SCHEMBL21177905 0.84 LMNA (1.00) LMNAMAPTCYP19A1CYP3A4HSD17B10
SCHEMBL5270893 0.84 LMNA (0.81) LMNAMAPTCYP19A1CYP3A4HSD17B10
Methandrostenolone SCHEMBL8408550 0.84 LMNA (1.00) LMNAMAPTCYP19A1CYP3A4HSD17B10
Methandrostenolone SCHEMBL16755284 0.84 LMNA (1.00) LMNAMAPTCYP19A1CYP3A4HSD17B10
Methandrostenolone SCHEMBL4435272 0.84 LMNA (1.00) LMNAMAPTCYP19A1CYP3A4HSD17B10
Methandrostenolone SCHEMBL28423591 0.84 LMNA (1.00) LMNAMAPTCYP19A1CYP3A4HSD17B10

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20240027902-A1 CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2024-01-25 — — US disclosed
US-20240027902-A1 CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2024-01-25 — — US disclosed
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