SCHEMBL27051373

SCHEMBL27051373

CCCOc1c(OC(F)(F)F)cccc1C(=O)O

nearest known ligand 0.45

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ F2R P25116 1/20 0.44
▸ MAPK1 P28482 1/20 0.43
▸ RXRA P19793 1/20 0.43
▸ RXRB P28702 1/20 0.43
▸ RXRG P48443 1/20 0.43
▸ KMT2A Q03164 4/20 0.41
▸ ALDH1A1 P00352 2/20 0.41
▸ PTK2B Q14289 1/20 0.41
▸ KCNK3 O14649 3/20 0.40
▸ KCNK9 Q9NPC2 3/20 0.40
▸ MEN1 O00255 2/20 0.40
▸ FABP3 P05413 2/20 0.40
▸ FABP4 P15090 2/20 0.40
▸ FABP5 Q01469 2/20 0.40
▸ HIF1A Q16665 1/20 0.40
▸ KDM4E B2RXH2 1/20 0.40
▸ RECQL P46063 1/20 0.40
▸ FFAR4 Q5NUL3 1/20 0.39
▸ CNR1 P21554 1/20 0.39
▸ CNR2 P34972 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL27051383 0.89 MAPK1 (0.45) F2RMAPK1RXRARXRBRXRG
SCHEMBL810987 0.85 KMT2A (0.51) MAPK1KMT2AALDH1A1PTK2BMEN1
SCHEMBL13607844 0.82 HTT (0.53) MAPK1KMT2AALDH1A1PTK2BKDM4E
SCHEMBL28423414 0.82 KMT2A (0.53) MAPK1KMT2AALDH1A1PTK2BMEN1
SCHEMBL4126979 0.81 KCNK3 (0.50) MAPK1RXRARXRBRXRGKMT2A
SCHEMBL20456493 0.81 RXRA (0.59) RXRARXRBRXRGALDH1A1FABP3
SCHEMBL27503076 0.80 TAS2R14 (0.48) F2RRXRARXRBRXRGKMT2A
SCHEMBL27051370 0.80 KMT2A (0.47) F2RRXRARXRBRXRGKMT2A
SCHEMBL19471185 0.80 MEN1 (0.46) F2RRXRARXRBRXRGKMT2A
SCHEMBL27051428 0.80 LIG1 (0.45) MAPK1RXRARXRBRXRGKMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20240027903-A1 Resist Material And Patterning Process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2024-01-25 — — US disclosed
US-20240027903-A1 Resist Material And Patterning Process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2024-01-25 — — US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20240027903-A1 Resist Material And Patterning Process LBR, HNRNPU, EWSR1 F2R 2729/4885MAPK1 1639/4885RXRA 2264/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.

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