Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TOP1 | P11387 | 1/20 | 0.62 |
| ▸ | KMT2A | Q03164 | 6/20 | 0.54 |
| ▸ | MAPT | P10636 | 2/20 | 0.54 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.54 |
| ▸ | PTGES | O14684 | 1/20 | 0.50 |
| ▸ | HSD17B10 | Q99714 | 3/20 | 0.49 |
| ▸ | PARP1 | P09874 | 1/20 | 0.49 |
| ▸ | SLC6A3 | Q01959 | 1/20 | 0.49 |
| ▸ | CASP3 | P42574 | 2/20 | 0.48 |
| ▸ | GAA | P10253 | 3/20 | 0.48 |
| ▸ | MEN1 | O00255 | 1/20 | 0.48 |
| ▸ | JAK2 | O60674 | 1/20 | 0.48 |
| ▸ | USP2 | O75604 | 1/20 | 0.48 |
| ▸ | ESR1 | P03372 | 1/20 | 0.48 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.48 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.48 |
| ▸ | ESR2 | Q92731 | 1/20 | 0.48 |
| ▸ | HPGD | P15428 | 2/20 | 0.45 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.45 |
| ▸ | LMNA | P02545 | 1/20 | 0.44 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL6367155 | 0.81 | TOP1 (0.69) | TOP1KMT2AMAPTSMN1; SMN2PTGES | |
| SCHEMBL2177078 | 0.80 | KDM4E (0.46) | TOP1KMT2AHSD17B10PARP1CASP3 | |
| SCHEMBL6634972 | 0.80 | KDM4E (0.54) | KMT2AMAPTSMN1; SMN2HSD17B10PARP1 | |
| SCHEMBL11524597 | 0.78 | TOP1 (0.66) | TOP1KMT2AMAPTSMN1; SMN2PTGES | |
| SCHEMBL9680641 | 0.77 | TOP1 (0.64) | TOP1KMT2AMAPTSMN1; SMN2PTGES | |
| SCHEMBL12827331 | 0.77 | TOP1 (1.00) | TOP1KMT2AMAPTSMN1; SMN2PTGES | |
| SCHEMBL31517375 | 0.76 | KMT2A (0.68) | TOP1KMT2AMAPTSMN1; SMN2PTGES | |
| SCHEMBL8094143 | 0.76 | KDM4E (0.47) | KMT2AMAPTSMN1; SMN2HSD17B10PARP1 | |
| SCHEMBL7645289 | 0.76 | TYMS (0.46) | TOP1HSD17B10PARP1CASP3GAA | |
| SCHEMBL28633753 | 0.76 | KDM4E (0.50) | TOP1KMT2AMAPTSMN1; SMN2HSD17B10 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 33 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-105637418-B | Negative working lithographic plate precursor | 伊斯曼柯达公司 | 2019-08-23 | — | — | CN | disclosed |
| CN-103917919-B | Lithographic printing plate precursors for on-press development | 伊斯曼柯达公司 | 2017-07-14 | — | — | CN | disclosed |
| EP-2920648-A1 | NEGATIVE-WORKING LITHOGRAPHIC PRINTING PLATE PRECURSOR | Eastman Kodak Company (US) | 2015-09-23 | — | — | EP | disclosed |
| EP-2888630-A1 | NEGATIVE-WORKING LITHOGRAPHIC PRINTING PLATE PRECURSORS AND USE | Eastman Kodak Company (US) | 2015-07-01 | — | — | EP | disclosed |
| EP-2758834-A1 | NEGATIVE-WORKING LITHOGRAPHIC PRINTING PLATE PRECURSORS | Eastman Kodak Company (US) | 2014-07-30 | — | — | EP | disclosed |
| EP-2751619-A1 | LITHOGRAPHIC PRINTING PLATE PRECURSORS FOR ON-PRESS DEVELOPMENT | Eastman Kodak Company (US) | 2014-07-09 | — | — | EP | disclosed |
| WO-2014078140-A1 | NEGATIVE-WORKING LITHOGRAPHIC PRINTING PLATE PRECURSOR | EASTMAN KODAK COMPANY (US) | 2014-05-22 | — | — | WO | disclosed |
| WO-2014031582-A1 | NEGATIVE-WORKING LITHOGRAPHIC PRINTING PLATE PRECURSORS AND USE | EASTMAN KODAK COMPANY (US) | 2014-02-27 | — | — | WO | disclosed |
| EP-2699426-A1 | ALUMINUM SUBSTRATES AND LITHOGRAPHIC PRINTING PLATE PRECURSORS | Eastman Kodak Company (US) | 2014-02-26 | — | — | EP | disclosed |
| EP-2646876-A1 | DEVELOPER AND ITS USE TO PEPARE LITHOGRAPHIC PRINTING PLATES | Eastman Kodak Company (US) | 2013-10-09 | — | — | EP | disclosed |
| WO-2009040104-A1 | METHOD FOR MAKING LITHOGRAPHIC PRINTING PLATES | EASTMAN KODAK COMPANY (US) | 2009-04-02 | — | — | WO | disclosed |
| WO-2009024592-A1 | PROCESSING OF LITHOGRAPHIC PRINTING PLATES WITH A DEVELOPER SOLUTION CONTAINING A HYDROPHILIC POLYMER | EASTMAN KODAK COMPANY (US) | 2009-02-26 | — | — | WO | disclosed |
| WO-2008058939-A2 | UV-SENSITIVE ELEMENTS WITH TRIARYLAMINE DERIVATIVES AS SENSITIZERS FOR CTP EXPOSURE | EASTMAN KODAK COMPANY (US) | 2008-05-22 | — | — | WO | disclosed |
| WO-2007121871-A1 | BAKEABLE LITHOGRAPHIC PRINTING PLATES WITH A HIGH RESISTANCE TO CHEMICALS | EASTMAN KODAK COMPANY (US) | 2007-11-01 | — | — | WO | disclosed |
| EP-1595183-A2 | RADIATION-SENSITIVE COMPOSITIONS COMPRISING OXAZOLE DERIVATIVES AND IMAGEABLE ELEMENTS BASED THEREON | Kodak Polychrome Graphics GmbH (DE) | 2005-11-16 | — | — | EP | disclosed |
| EP-1565790-A1 | RADIATION-SENSITIVE ELEMENTS AND THEIR STORAGE STABILITY | Kodak Polychrome Graphics GmbH (DE) | 2005-08-24 | — | — | EP | disclosed |
| EP-1565788-A1 | PHOTOPOLYMER COMPOSITION SUITABLE FOR LITHOGRAPHIC PRINTING PLATES | Kodak Polychrome Graphics GmbH (DE) | 2005-08-24 | — | — | EP | disclosed |
| WO-2004074930-A2 | RADIATION-SENSITIVE COMPOSITIONS COMPRISING OXAZOLE DERIVATIVES AND IMAGEABLE ELEMENTS BASED THEREON | KODAK POLYCHROME GRAPHICS GMBH (DE) | 2004-09-02 | — | — | WO | disclosed |
| WO-2004049071-A1 | RADIATION-SENSITIVE ELEMENTS AND THEIR STORAGE STABILITY | KODAK POLYCHROME GRAPHICS GMBH (DE) | 2004-06-10 | — | — | WO | disclosed |
| WO-2004049069-A1 | PHOTOPOLYMER COMPOSITION SUITABLE FOR LITHOGRAPHIC PRINTING PLATES | KODAK POLYCHROME GRAPHICS GMBH (DE) | 2004-06-10 | — | — | WO | disclosed |