SCHEMBL8906167

SCHEMBL8906167

O=C1C=CC2=CC(=O)C=CC2=C1.[N-]=[N+]=N.[N-]=[N+]=[N-]

nearest known ligand 0.37

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 2/20 0.37
RECQL P46063 2/20 0.37
TDP1 Q9NUW8 2/20 0.37
BCHE P06276 1/20 0.37
POLB P06746 1/20 0.37
MAOA P21397 1/20 0.37
ACHE P22303 1/20 0.37
MAOB P27338 1/20 0.37
APEX1 P27695 1/20 0.37
MAPK1 P28482 1/20 0.37
CASP1 P29466 1/20 0.37
BLM P54132 1/20 0.37
MDM2 Q00987 1/20 0.37
DHODH Q02127 1/20 0.37
HSD17B10 Q99714 1/20 0.37
APOBEC3G Q9HC16 1/20 0.37
CA1 P00915 1/20 0.33
CA6 P23280 1/20 0.33
CA5A P35218 1/20 0.33
CA9 Q16790 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Benzoquinone SCHEMBL27254 0.85 ALDH1A1 (0.53) ALDH1A1RECQLTDP1BCHEPOLB
Benzoquinone SCHEMBL11519889 0.82 ALDH1A1 (0.50) ALDH1A1RECQLTDP1BCHEPOLB
Benzoquinone SCHEMBL2813322 0.82 ALDH1A1 (0.57) ALDH1A1RECQLTDP1BCHEPOLB
SCHEMBL592447 0.82 MAOA (0.54) ALDH1A1RECQLTDP1BCHEPOLB
SCHEMBL8904979 0.76 MAOA (0.32) MAOAMAOB
Benzoquinone SCHEMBL6318381 0.76 ALDH1A1 (0.42) ALDH1A1RECQLTDP1BCHEPOLB
Benzoquinone SCHEMBL2813316 0.75 ALDH1A1 (0.67) ALDH1A1RECQLTDP1BCHEPOLB
SCHEMBL11302513 0.74 MEN1 (0.34) ALDH1A1RECQLTDP1MEN1MAPT
SCHEMBL10713186 0.72 CA1 (0.33) CA1CA6CA5ACA9CA5B
Benzoquinone SCHEMBL8626462 0.70 ALDH1A1 (0.36) ALDH1A1RECQLTDP1BCHEPOLB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-5644038-A PHOTORESISTS INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 1997-07-01 US disclosed
US-5567569-A POSITIVE PHOTORESISTS INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 1996-10-22 US disclosed
EP-0704763-A1 Photoactive compound, preparation thereof and use thereof in resist for x-ray or electron beam lithography International Business Machines Corporation (US) 1996-04-03 EP disclosed
US-4603195-A Organosilicon compound and use thereof in photolithography INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 1986-07-29 US disclosed