Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CYP3A4 | P08684 | 8/20 | 0.54 |
| ▸ | TDP1 | Q9NUW8 | 7/20 | 0.54 |
| ▸ | TSHR | P16473 | 4/20 | 0.54 |
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.54 |
| ▸ | S100B | P04271 | 1/20 | 0.42 |
| ▸ | MAPK1 | P28482 | 3/20 | 0.42 |
| ▸ | SKP2 | Q13309 | 1/20 | 0.41 |
| ▸ | THRB | P10828 | 3/20 | 0.39 |
| ▸ | ALOX15 | P16050 | 2/20 | 0.39 |
| ▸ | RECQL | P46063 | 1/20 | 0.39 |
| ▸ | HIF1A | Q16665 | 1/20 | 0.39 |
| ▸ | TP53 | P04637 | 2/20 | 0.39 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.39 |
| ▸ | ESR1 | P03372 | 2/20 | 0.37 |
| ▸ | AR | P10275 | 1/20 | 0.37 |
| ▸ | ESR2 | Q92731 | 1/20 | 0.37 |
| ▸ | CASP1 | P29466 | 1/20 | 0.37 |
| ▸ | GCK | P35557 | 1/20 | 0.36 |
| ▸ | RAD52 | P43351 | 2/20 | 0.36 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.36 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL31457312 | 0.91 | CYP3A4 (0.58) | CYP3A4TDP1TSHRALDH1A1S100B | |
| SCHEMBL7189976 | 0.91 | CYP3A4 (0.58) | CYP3A4TDP1TSHRALDH1A1S100B | |
| SCHEMBL11354311 | 0.89 | GCK (0.47) | CYP3A4TDP1TSHRALDH1A1S100B | |
| SCHEMBL20565650 | 0.88 | CYP3A4 (0.45) | CYP3A4TDP1TSHRALDH1A1MAPK1 | |
| SCHEMBL7195456 | 0.86 | CYP3A4 (0.42) | CYP3A4TDP1TSHRALDH1A1S100B | |
| SCHEMBL11808310 | 0.85 | CYP3A4 (0.54) | CYP3A4TDP1TSHRALDH1A1S100B | |
| SCHEMBL7192026 | 0.84 | ALDH1A1 (0.43) | CYP3A4TDP1TSHRALDH1A1S100B | |
| SCHEMBL6371600 | 0.83 | CYP3A4 (0.52) | CYP3A4TDP1TSHRALDH1A1S100B | |
| SCHEMBL7184598 | 0.80 | PDE7A (0.44) | CYP3A4TDP1TSHRALDH1A1S100B | |
| SCHEMBL8174643 | 0.80 | ALDH1A1 (0.54) | CYP3A4TDP1TSHRALDH1A1MAPK1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 330 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8080319-B2 | Thermosetting resin composition and use thereof | Kippon Kayaku Kabushiki Kaisha (JP) | 2011-12-20 | — | — | US | claimed |
| US-20090286087-A1 | Thermosetting Resin Composition and Use thereof | NIPPON KAYAKU KABUSHIKI KAISHA (JP) | 2009-11-19 | — | — | US | claimed |
| EP-1579272-A4 | STABLE NON-PHOTOSENSITIVE POLYIMIDE PRECURSOR COMPOSITIONS FOR USE IN BILAYER IMAGING SYSTEMS | FUJIFILM ELECTRONIC MATERIALS (US) | 2008-12-17 | — | — | EP | claimed |
| US-7416830-B2 | Photosensitive resin compositions | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) | 2008-08-26 | — | — | US | claimed |
| US-20070009751-A1 | Polyamic acid resin composition modified with laminate nanometer silica sheet and polyimide prepared therefrom | CHANG CHUN PLASTICS CO., LTD. (TW) | 2007-01-11 | — | — | US | claimed |
| EP-1680711-A2 | NOVEL PHOTOSENSITIVE RESIN COMPOSITIONS | Fujifilm Electronic Materials USA, Inc. (US) | 2006-07-19 | — | — | EP | claimed |
| US-7018776-B2 | Stable non-photosensitive polyimide precursor compositions for use in bilayer imaging systems | ARCH SPECIALTY CHEMICALS, INC. (US) | 2006-03-28 | — | — | US | claimed |
| US-20060063095-A9 | Novel photosensitive resin compositions | ARCH SPECIALTY CHEMICALS, INC. | 2006-03-23 | — | — | US | claimed |
| EP-1609026-A2 | PROCESS FOR PRODUCING A HEAT RESISTANT RELIEF STRUCTURE | FujiFilm Electronic Materials USA, Inc. (US) | 2005-12-28 | — | — | EP | claimed |
| EP-1579272-A2 | STABLE NON-PHOTOSENSITIVE POLYIMIDE PRECURSOR COMPOSITIONS FOR USE IN BILAYER IMAGING SYSTEMS | Fujifilm Electronic Materials USA, Inc. (US) | 2005-09-28 | — | — | EP | claimed |
| US-20050181297-A1 | Novel photosensitive resin compositions | ARCH SPECIALTY CHEMICALS, INC. | 2005-08-18 | — | — | US | claimed |
| WO-2005038524-A2 | NOVEL PHOTOSENSITIVE RESIN COMPOSITIONS | ARCH SPECIALTY CHEMICALS, INC. (US) | 2005-04-28 | — | — | WO | claimed |
| US-20040161711-A1 | Stable non-photosensitive polyimide precursor compositions for use in bilayer imaging systems | ARCH SPECIALTY CHEMICALS, INC. | 2004-08-19 | — | — | US | claimed |
| US-20040161619-A1 | Process for producing a heat resistant relief structure | ARCH SPECIALTY CHEMICALS, INC. | 2004-08-19 | — | — | US | claimed |
| WO-2004055593-A2 | PROCESS FOR PRODUCING A HEAT RESISTANT RELIEF STRUCTURE | ARCH SPECIALTY CHEMICALS, INC. (US) | 2004-07-01 | — | — | WO | claimed |
| WO-2004055592-A2 | STABLE NON-PHOTOSENSITIVE POLYIMIDE PRECURSOR COMPOISTIONS FOR USE IN BILAYER IMAGING SYSTEMS | ARCH SPECIALTY CHEMICALS, INC. (US) | 2004-07-01 | — | — | WO | claimed |
| US-4886873-A | ELASTICITY AND HEAT RESISTANCE | DIRECTOR-GENERAL OF AGENCY OF INDUSTRIAL SCIENCE AND TECHNOLOGY (JP) | 1989-12-12 | — | — | US | claimed |
| US-20230331915-A1 | Isocyanate-Modified Polyimide Resin, Resin Composition and Cured Product of Same | NIPPON KAYAKU KABUSHIKI KAISHA (JP) | 2023-10-19 | — | — | US | disclosed |
| US-3987003-A | THERMALLY STABLE DIOXO AND DITHIO-BENZISOQUINOLINE COMPOSITIONS AND PROCESS OF SYNTHESIZING SAME | THE UNITED STATES OF AMERICA AS REPRESENTED BY THE SECRETARY OF THE AIR FORCE (US) | 1976-10-19 | — | — | US | disclosed |
| US-3960980-A | Method of producing elastomer resins | BRIDGESTONE TIRE COMPANY LIMITED (JA) | 1976-06-01 | — | — | US | disclosed |