SCHEMBL273387

SCHEMBL273387

C=CCCNC(C)=O

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9314179 0.86
SCHEMBL9312119 0.84 KDM4E (0.62)
SCHEMBL20859581 0.82 KDM4E (0.67)
SCHEMBL9968859 0.82 KDM4E (0.67)
SCHEMBL2858627 0.79 ALDH1A1 (0.34)
SCHEMBL5466428 0.79 KDM4E (0.55)
SCHEMBL22856384 0.79 EPHX1 (0.37)
Urea SCHEMBL11541326 0.78 ALDH1A1 (0.33)
SCHEMBL24209780 0.78 MTNR1A (0.42)
SCHEMBL293767 0.77

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 344 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-116285915-B Environment-friendly high-temperature-resistant drilling fluid for shale deep well and preparation method thereof 中石化石油工程技术服务有限公司 2024-04-09 CN claimed
CN-116285915-A Environment-friendly high-temperature-resistant drilling fluid for shale deep well and preparation method thereof 中石化石油工程技术服务有限公司 2023-06-23 CN claimed
CN-110483686-B Environment-friendly cationic fluid loss reducing composition and fluid loss reducing agent SHIJIAZHUANG HUAXIN MUD ADDITIVES Co.,Ltd. (CN) 2021-08-31 CN claimed
CN-109207131-B Well wall repair enhancer and preparation method thereof 中国石油化工股份有限公司 2021-03-16 CN claimed
EP-1077683-A1 ANTIDEPRESSANT THERAPY ALZA CORPORATION (US) 2001-02-28 EP claimed
WO-1999058115-A1 ANTIDEPRESSANT THERAPY ALZA CORPORATION (US) 1999-11-18 WO claimed
EP-4223537-B1 INK-JET INK AND INK-JET RECORDING METHOD FUJIFILM CORP (JP) 2026-04-15 EP disclosed
EP-4223538-B1 INKJET RECORDING METHOD FUJIFILM CORP (JP) 2026-04-15 EP disclosed
EP-4036123-B1 PARTICLE, AQUEOUS DISPERSION, INK JET INK, FILM-FORMING METHOD, AND IMAGE-FORMING METHOD FUJIFILM CORP (JP) 2026-04-01 EP disclosed
EP-3660111-B1 INK COMPOSITION, METHOD FOR PRODUCING SAME, AND IMAGE FORMATION METHOD FUJIFILM CORP (JP) 2026-02-18 EP disclosed
EP-3887454-B1 JETTABLE COMPOSITION ELECTRA POLYMERS LTD (GB) 2026-01-28 EP disclosed
US-12460098-B2 Jettable composition ELECTRA POLYMERS LTD (GB) 2025-11-04 US disclosed
CN-120152853-A Ink jet recording apparatus and ink jet recording method 富士胶片株式会社 2025-06-13 CN disclosed
US-4065435-A OXIDATION-REDUCTION PROPERTIES, ACRYLIC FUJI PHOTO FILM CO., LTD. (JA) 1977-12-27 US disclosed
US-4058443-A PHOTOPOLYMERIZATION, BINDER, CHLORINATED POLYOLEFIN FUJI PHOTO FILM CO., LTD. (JA) 1977-11-15 US disclosed
US-4054722-A PHOTOGRAPHY FUJI PHOTO FILM CO., LTD. (JA) 1977-10-18 US disclosed
US-4050936-A Image forming process with photopolymer layers between a support and a substrate FUJI PHOTO FILM CO., LTD. (JA) 1977-09-27 US disclosed
US-4041017-A Reactive light-sensitive high polymer compound containing furyl pentadienic ester groups and insolubilized by action of heat, light or electron beams FUJI PHOTO FILM CO., LTD. (JA) 1977-08-09 US disclosed
US-3936429-A Reactive polymer FUJI PHOTO FILM CO., LTD. (JA) 1976-02-03 US disclosed
US-3931248-A Reactive high polymer compound FUJI PHOTO FILM CO., LTD. (JA) 1976-01-06 US disclosed