SCHEMBL2734323

SCHEMBL2734323

C1CCCN2CCCN=C2CC1

nearest known ligand 1.00 ✓ in ChEMBL — recovers established targets

Predicted protein targets (top 12)

geneUniProtsupporting neighboursconfidence
INMT O95050 4/20 1.00
USP2 O75604 2/20 1.00
ACHE P22303 6/20 0.38
NOS3 P29474 4/20 0.36
NOS1 P29475 4/20 0.36
NOS2 P35228 4/20 0.36
SMN1; SMN2 Q16637 1/20 0.35
TDP1 Q9NUW8 1/20 0.35
ALDH1A1 P00352 2/20 0.34
TSHR P16473 1/20 0.34
LMNA P02545 1/20 0.34
L3MBTL1 Q9Y468 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10601682 1.00 INMT (1.00) INMTUSP2ACHENOS3NOS1
SCHEMBL16583523 1.00 INMT (1.00) INMTUSP2ACHENOS3NOS1
SCHEMBL2401189 1.00 INMT (1.00) INMTUSP2ACHENOS3NOS1
SCHEMBL17417853 1.00 INMT (1.00) INMTUSP2ACHENOS3NOS1
SCHEMBL6853620 1.00 INMT (1.00) INMTUSP2ACHENOS3NOS1
SCHEMBL3047 1.00 INMT (1.00) INMTUSP2ACHENOS3NOS1
Iodide SCHEMBL23365018 0.98 INMT (0.95) INMTUSP2ACHENOS3NOS1
Ammonia Solution, Strong SCHEMBL6834929 0.98 INMT (0.95) INMTUSP2ACHENOS3NOS1
Bromide SCHEMBL8469764 0.98 INMT (0.95) INMTUSP2ACHENOS3NOS1
SCHEMBL2544511 0.98 INMT (0.95) INMTUSP2ACHENOS3NOS1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 62 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2838934-A2 MOSITURE CURABLE ORGANOPOLYSILOXANE COMPOSITION Momentive Performance Materials Inc. (US) 2015-02-25 EP claimed
US-20150038632-A1 MOISTURE CURABLE ORGANOPOLYSILOXANE COMPOSITION MOMENTIVE PERFORMANCE MATERIALS INC. 2015-02-05 US claimed
WO-2013158236-A2 MOSITURE CURABLE ORGANOPOLYSILOXANE COMPOSITION MOMENTIVE PERFORMANCE MATERIALS INC. (US) 2013-10-24 WO claimed
EP-4731740-A1 ALKALINE COMPOSITION, ITS USE AND A PROCESS FOR CLEANING SUBSTRATES COMPRISING COBALT AND COPPER BASF SE (DE) 2026-04-29 EP disclosed
US-20250346827-A1 COMPOSITION, CLEANING METHOD OF SEMICONDUCTOR SUBSTRATE, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE FUJIFILM CORPORATION (JP) 2025-11-13 US disclosed
US-12374540-B2 Post-CMP semiconductor cleaning composition comprising an amine/alkanolamine mixture FUJIFILM CORPORATION (JP) 2025-07-29 US disclosed
EP-4569023-A1 COMBINATION OF CATALYTIC COMPONENTS PolyU GmbH (DE) 2025-06-18 EP disclosed
US-12312569-B2 Kit for cleaning agent and method for preparing cleaning agent FUJIFILM CORPORATION (JP) 2025-05-27 US disclosed
US-12247300-B2 Cleaning solution and cleaning method FUJIFILM CORPORATION (JP) 2025-03-11 US disclosed
EP-4503093-A1 COMPOSITION, AND PRODUCTION METHOD FOR SEMICONDUCTOR ELEMENT FUJIFILM Corporation (JP) 2025-02-05 EP disclosed
WO-2024260812-A1 ALKALINE COMPOSITION, ITS USE AND A PROCESS FOR CLEANING SUBSTRATES COMPRISING COBALT AND COPPER BASF SE (DE) 2024-12-26 WO disclosed
US-7745007-B2 Release sheets and methods of making the same S.D. WARREN COMPANY (US) 2010-06-29 US disclosed
US-7745007-B2 Release sheets and methods of making the same S.D. WARREN COMPANY (US) 2010-06-29 US disclosed
EP-2159641-A1 SURFACE TREATMENT AGENT FOR FORMING PATTERN AND PATTERN FORMING METHOD USING THE TREATMENT AGENT Fujifilm Corporation (JP) 2010-03-03 EP disclosed
US-20080241742-A1 SURFACE-TREATING AGENT FOR PATTERN FORMATION AND PATTERN-FORMING METHOD USING THE SURFACE-TREATING AGENT FUJIFILM CORPORATION (JP) 2008-10-02 US disclosed
US-20080241742-A1 SURFACE-TREATING AGENT FOR PATTERN FORMATION AND PATTERN-FORMING METHOD USING THE SURFACE-TREATING AGENT FUJIFILM CORPORATION (JP) 2008-10-02 US disclosed
EP-1975718-A2 Surface-treating agent for pattern formation and pattern-forming method using the surface-treating agent FUJIFILM Corporation (JP) 2008-10-01 EP disclosed
WO-2008055026-A2 RELEASE SHEETS AND METHODS OF MAKING THE SAME S.D. WARREN COMPANY (US) 2008-05-08 WO disclosed
US-20080102271-A1 Release sheets and methods of making the same S.D. WARREN COMPANY 2008-05-01 US disclosed
US-20080102271-A1 Release sheets and methods of making the same S.D. WARREN COMPANY 2008-05-01 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20080241742-A1 SURFACE-TREATING AGENT FOR PATTERN FORMATION AND PATTERN-FORMING METHOD USING THE SURFACE-TREATING AGENT KRT18, FSCN1, SLC11A2 INMT 2950/4885USP2 1775/4885ACHE 1994/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.