Predicted protein targets (top 8)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | RIPK1 | Q13546 | 2/20 | 0.38 |
| ▸ | METAP2 | P50579 | 2/20 | 0.34 |
| ▸ | METAP1 | P53582 | 2/20 | 0.34 |
| ▸ | MEN1 | O00255 | 1/20 | 0.32 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.32 |
| ▸ | BIRC2 | Q13490 | 1/20 | 0.32 |
| ▸ | TSHR | P16473 | 1/20 | 0.32 |
| ▸ | MMP8 | P22894 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL14649802 | 0.79 | RIPK1 (0.37) | RIPK1METAP2METAP1TSHRMMP8 | |
| SCHEMBL2734967 | 0.78 | METAP2 (0.37) | RIPK1METAP2 | |
| SCHEMBL20047507 | 0.74 | RIPK1 (0.47) | RIPK1TSHR | |
| SCHEMBL14649798 | 0.74 | RIPK1 (0.36) | RIPK1METAP2METAP1MMP8 | |
| SCHEMBL25748849 | 0.73 | RIPK1 (0.42) | RIPK1MEN1KMT2AMMP8 | |
| SCHEMBL749946 | 0.72 | RIPK1 (0.47) | RIPK1MEN1KMT2ATSHRMMP8 | |
| SCHEMBL18681250 | 0.72 | RIPK1 (0.45) | RIPK1 | |
| SCHEMBL18681666 | 0.70 | RIPK1 (0.41) | RIPK1 | |
| SCHEMBL47526 | 0.70 | CYP4F2 (0.37) | — | |
| SCHEMBL23175981 | 0.69 | RIPK1 (0.42) | RIPK1MEN1KMT2A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8088550-B2 | Positive resist composition and pattern forming method | FUJIFILM CORPORATION (JP) | 2012-01-03 | — | — | US | disclosed |
| US-20090035692-A1 | POSITIVE RESIST COMPOSITION AND PATTERN FORMING MEHTOD | FUJIFILM CORPORATION (JP) | 2009-02-05 | — | — | US | disclosed |
| US-20090023096-A1 | POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD | FUJIFILM CORPORATION (JP) | 2009-01-22 | — | — | US | disclosed |