Predicted protein targets (top 6)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HMGCR | P04035 | 3/20 | 0.36 |
| ▸ | FKBP1A | P62942 | 6/20 | 0.33 |
| ▸ | MEN1 | O00255 | 1/20 | 0.32 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.32 |
| ▸ | LMNA | P02545 | 1/20 | 0.31 |
| ▸ | POLB | P06746 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL15697292 | 0.96 | LMNA (0.34) | HMGCRFKBP1ALMNAPOLB | |
| SCHEMBL13016355 | 0.86 | HMGCR (0.31) | HMGCR | |
| SCHEMBL15697295 | 0.86 | MEN1 (0.30) | MEN1KMT2A | |
| SCHEMBL785892 | 0.85 | FKBP1A (0.37) | HMGCRFKBP1AMEN1KMT2A | |
| SCHEMBL12263816 | 0.84 | HMGCR (0.35) | HMGCRFKBP1AMEN1KMT2ALMNA | |
| SCHEMBL15697293 | 0.84 | — | — | |
| SCHEMBL13016339 | 0.84 | HMGCR (0.31) | HMGCR | |
| SCHEMBL13016347 | 0.83 | — | — | |
| SCHEMBL15697294 | 0.82 | LMNA (0.33) | LMNAPOLB | |
| SCHEMBL17424231 | 0.82 | MEN1 (0.36) | HMGCRFKBP1AMEN1KMT2A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 12 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20180087010-A1 | PRE-RINSING LIQUID, PRE-RINSING TREATMENT METHOD, AND PATTERN FORMING METHOD | FUJIFILM CORPORATION (JP) | 2018-03-29 | — | — | US | disclosed |
| US-9746771-B2 | Laminate body | FUJIFILM CORPORATION (JP) | 2017-08-29 | — | — | US | disclosed |
| US-9448482-B2 | Pattern forming method, resist pattern formed by the method, method for manufacturing electronic device using the same, and electronic device | FUJIFILM CORPORATION (JP) | 2016-09-20 | — | — | US | disclosed |
| US-20160170303-A1 | LAMINATE BODY | FUJIFILM CORPORATION (JP) | 2016-06-16 | — | — | US | disclosed |
| US-9310682-B2 | Positive-type resist composition | CENTRAL GLASS COMPANY, LIMITED (JP) | 2016-04-12 | — | — | US | disclosed |
| US-20150253673-A1 | PATTERN FORMING METHOD, RESIST PATTERN FORMED BY THE METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE USING THE SAME, AND ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2015-09-10 | — | — | US | disclosed |
| US-20150197663-A1 | SELF-ORGANIZING COMPOSITION FOR FORMING PATTERN, METHOD FOR FORMING PATTERN BY SELF-ORGANIZATION OF BLOCK COPOLYMER USING SAME, AND PATTERN | FUJIFILM CORPORATION (JP) | 2015-07-16 | — | — | US | disclosed |
| US-20150086912-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM AND PATTERN FORMING METHOD USING THE SAME, MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE | FUJIFILM CORPORATION (JP) | 2015-03-26 | — | — | US | disclosed |
| US-20140134542-A1 | Positive-Type Resist Composition | CENTRAL GLASS COMPANY, LIMITED (JP) | 2014-05-15 | — | — | US | disclosed |
| US-8088550-B2 | Positive resist composition and pattern forming method | FUJIFILM CORPORATION (JP) | 2012-01-03 | — | — | US | disclosed |
| US-20090035692-A1 | POSITIVE RESIST COMPOSITION AND PATTERN FORMING MEHTOD | FUJIFILM CORPORATION (JP) | 2009-02-05 | — | — | US | disclosed |
| US-20090023096-A1 | POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD | FUJIFILM CORPORATION (JP) | 2009-01-22 | — | — | US | disclosed |