Predicted protein targets (top 1)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL132911 | 0.83 | TSHR (0.40) | TSHR | |
| SCHEMBL12892529 | 0.82 | — | — | |
| SCHEMBL47419 | 0.82 | MMP8 (0.30) | — | |
| SCHEMBL15945465 | 0.81 | — | — | |
| SCHEMBL16683156 | 0.81 | — | — | |
| SCHEMBL15362564 | 0.81 | TSHR (0.32) | TSHR | |
| SCHEMBL16591029 | 0.81 | — | — | |
| SCHEMBL16591026 | 0.81 | — | — | |
| SCHEMBL14258803 | 0.80 | MMP8 (0.33) | — | |
| SCHEMBL47442 | 0.80 | LMNA (0.42) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20180087010-A1 | PRE-RINSING LIQUID, PRE-RINSING TREATMENT METHOD, AND PATTERN FORMING METHOD | FUJIFILM CORPORATION (JP) | 2018-03-29 | — | — | US | disclosed |
| US-9746771-B2 | Laminate body | FUJIFILM CORPORATION (JP) | 2017-08-29 | — | — | US | disclosed |
| US-20160170303-A1 | LAMINATE BODY | FUJIFILM CORPORATION (JP) | 2016-06-16 | — | — | US | disclosed |
| US-20160131976-A1 | RESIST COMPOSITION FOR SEMICONDUCTOR MANUFACTURING PROCESS; RESIST FILM, RESIST-COATED MASK BLANKS, PHOTOMASK, AND RESIST PATTERNING METHOD USING SAID RESIST COMPOSITION; ELECTRONIC-DEVICE MANUFACTURING METHOD; AND ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2016-05-12 | — | — | US | disclosed |
| US-20150086912-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM AND PATTERN FORMING METHOD USING THE SAME, MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE | FUJIFILM CORPORATION (JP) | 2015-03-26 | — | — | US | disclosed |
| US-8709701-B2 | Resist underlayer film forming composition for lithography, containing aromatic fused ring-containing resin | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2014-04-29 | — | — | US | disclosed |
| US-8088546-B2 | Underlayer coating forming composition for lithography containing naphthalene ring having halogen atom | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2012-01-03 | — | — | US | disclosed |
| US-20110207331-A1 | Resist underlayer film forming composition for lithography, containing aromatic fused ring-containing resin | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2011-08-25 | — | — | US | disclosed |
| US-20100022090-A1 | RESIST UNDERLAYER FILM FORMING COMPOSITION FOR LITHOGRAPHY, CONTAINING AROMATIC FUSED RING-CONTAINING RESIN | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2010-01-28 | — | — | US | disclosed |
| US-20070238029-A1 | Underlayer Coating Forming Composition for Lithography Containing Naphthalene Ring Having Halogen Atom | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2007-10-11 | — | — | US | disclosed |
| US-7226721-B2 | Underlayer coating forming composition for lithography containing compound having protected carboxyl group | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2007-06-05 | — | — | US | disclosed |