Predicted protein targets (top 18)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MAPT | P10636 | 4/20 | 0.50 |
| ▸ | KMT2A | Q03164 | 4/20 | 0.50 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.50 |
| ▸ | MEN1 | O00255 | 3/20 | 0.50 |
| ▸ | RAB9A | P51151 | 2/20 | 0.49 |
| ▸ | NPC1 | O15118 | 1/20 | 0.49 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.49 |
| ▸ | CA12 | O43570 | 2/20 | 0.47 |
| ▸ | CA9 | Q16790 | 2/20 | 0.47 |
| ▸ | CYP19A1 | P11511 | 1/20 | 0.46 |
| ▸ | HPGD | P15428 | 3/20 | 0.46 |
| ▸ | CA1 | P00915 | 2/20 | 0.46 |
| ▸ | CA2 | P00918 | 2/20 | 0.46 |
| ▸ | LMNA | P02545 | 2/20 | 0.46 |
| ▸ | FFAR4 | Q5NUL3 | 1/20 | 0.45 |
| ▸ | STS | P08842 | 1/20 | 0.44 |
| ▸ | L3MBTL1 | Q9Y468 | 2/20 | 0.44 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.44 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL25864252 | 0.84 | MAPT (0.46) | MAPTKMT2AALDH1A1MEN1RAB9A | |
| SCHEMBL11696351 | 0.83 | ALDH1A1 (0.55) | MAPTKMT2AALDH1A1MEN1RAB9A | |
| SCHEMBL29115354 | 0.82 | KMT2A (0.47) | MAPTKMT2AALDH1A1MEN1RAB9A | |
| SCHEMBL2717809 | 0.81 | CA2 (0.57) | KMT2AALDH1A1RAB9ASMN1; SMN2CA12 | |
| SCHEMBL13370692 | 0.81 | CA2 (0.38) | MAPTKMT2AALDH1A1MEN1CA12 | |
| SCHEMBL12036373 | 0.79 | ALDH1A1 (0.44) | KMT2AALDH1A1CA12CA9CA1 | |
| SCHEMBL14354527 | 0.79 | ALDH1A1 (0.50) | ALDH1A1SMN1; SMN2CA12CA9CA1 | |
| SCHEMBL4027167 | 0.78 | MAPT (0.61) | MAPTKMT2AALDH1A1RAB9ANPC1 | |
| SCHEMBL14101261 | 0.77 | ALDH1A1 (0.56) | MAPTKMT2AALDH1A1MEN1SMN1; SMN2 | |
| SCHEMBL2739644 | 0.76 | CA1 (0.56) | MAPTKMT2AALDH1A1MEN1RAB9A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 65 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20230400771-A1 | ON-PRESS DEVELOPMENT TYPE LITHOGRAPHIC PRINTING PLATE PRECURSOR, METHOD OF PREPARING LITHOGRAPHIC PRINTING PLATE, AND LITHOGRAPHIC PRINTING METHOD | FUJIFILM CORPORATION (JP) | 2023-12-14 | — | — | US | disclosed |
| US-20230226814-A1 | ON-PRESS DEVELOPMENT TYPE LITHOGRAPHIC PRINTING PLATE PRECURSOR, METHOD OF PREPARING LITHOGRAPHIC PRINTING PLATE, AND LITHOGRAPHIC PRINTING METHOD | FUJIFILM CORPORATION (JP) | 2023-07-20 | — | — | US | disclosed |
| US-20230161247-A1 | ON-PRESS DEVELOPMENT TYPE LITHOGRAPHIC PRINTING PLATE PRECURSOR, METHOD OF PREPARING LITHOGRAPHIC PRINTING PLATE, AND LITHOGRAPHIC PRINTING METHOD | FUJIFILM CORPORATION (JP) | 2023-05-25 | — | — | US | disclosed |
| US-20230150254-A1 | ON-PRESS DEVELOPMENT TYPE LITHOGRAPHIC PRINTING PLATE PRECURSOR, METHOD OF PREPARING LITHOGRAPHIC PRINTING PLATE, AND LITHOGRAPHIC PRINTING METHOD | FUJIFILM CORPORATION (JP) | 2023-05-18 | — | — | US | disclosed |
| US-20230127702-A1 | ON-PRESS DEVELOPMENT TYPE LITHOGRAPHIC PRINTING PLATE PRECURSOR, METHOD OF PREPARING LITHOGRAPHIC PRINTING PLATE, AND LITHOGRAPHIC PRINTING METHOD | FUJIFILM CORPORATION (JP) | 2023-04-27 | — | — | US | disclosed |
| US-20140283702-A1 | LITHOGRAPHIC PRINTING PLATE SUPPORT AND NEGATIVE PHOTOSENSITIVE LITHOGRAPHIC PRINTING PLATE | MITSUBISHI PAPER MILLS LIMITED (JP) | 2014-09-25 | — | — | US | disclosed |
| US-20140283702-A1 | LITHOGRAPHIC PRINTING PLATE SUPPORT AND NEGATIVE PHOTOSENSITIVE LITHOGRAPHIC PRINTING PLATE | MITSUBISHI PAPER MILLS LIMITED (JP) | 2014-09-25 | — | — | US | disclosed |
| US-8647813-B2 | Photosensitive composition and photosensitive lithographic printing plate material | MITSUBISHI PAPER MILLS LIMITED (JP) | 2014-02-11 | — | — | US | disclosed |
| US-8647813-B2 | Photosensitive composition and photosensitive lithographic printing plate material | MITSUBISHI PAPER MILLS LIMITED (JP) | 2014-02-11 | — | — | US | disclosed |
| US-8632953-B2 | Process for making lithographic printing plate | FUJIFILM CORPORATION (JP) | 2014-01-21 | — | — | US | disclosed |
| US-7192694-B2 | Photothermographic material | FUJIFILM CORPORATION (JP) | 2007-03-20 | — | — | US | disclosed |
| US-20070026349-A1 | when parallel light having the same wavelength as a main emission peak wavelength of the fluorescent intensifying screen is incident perpendicular to the material surface, the parallel light component of transmitted light comprises 5% or more of the incident light; for medical use having high sensitivity | FUJI PHOTO FILM CO., LTD. | 2007-02-01 | — | — | US | disclosed |
| US-20070003887-A1 | Photothermographic material | RIKIO INOUE | 2007-01-04 | — | — | US | disclosed |
| US-20070003887-A1 | Photothermographic material | RIKIO INOUE | 2007-01-04 | — | — | US | disclosed |
| US-7157218-B2 | Suppressed fogging and printout and is excellent in storage stability of an image against stain | FUJIFILM CORPORATION (JP) | 2007-01-02 | — | — | US | disclosed |
| US-7157217-B2 | Photothermographic material | FUJIFILM CORPORATION (JP) | 2007-01-02 | — | — | US | disclosed |
| US-7158164-B2 | Thermal development method and apparatus | FUJI PHOTO FILM CO., LTD. (JP) | 2007-01-02 | — | — | US | disclosed |
| US-7158164-B2 | Thermal development method and apparatus | FUJI PHOTO FILM CO., LTD. (JP) | 2007-01-02 | — | — | US | disclosed |
| US-7157665-B2 | Heat development apparatus and method | FUJI PHOTO FILM CO., LTD. (JP) | 2007-01-02 | — | — | US | disclosed |
| US-7157665-B2 | Heat development apparatus and method | FUJI PHOTO FILM CO., LTD. (JP) | 2007-01-02 | — | — | US | disclosed |