SCHEMBL27397888

SCHEMBL27397888

Cc1cc(C)c(O)c(C(=O)OC(C)(C)C)c1

nearest known ligand 0.44

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ CYP2C9 P11712 1/20 0.44
▸ CYP2C19 P33261 1/20 0.44
▸ NPSR1 Q6W5P4 1/20 0.44
▸ NR2F2 P24468 1/20 0.42
▸ KDM4E B2RXH2 2/20 0.38
▸ ALDH1A1 P00352 2/20 0.38
▸ LMNA P02545 1/20 0.38
▸ GAA P10253 1/20 0.38
▸ MAPT P10636 1/20 0.38
▸ EGFR P00533 1/20 0.36
▸ HMGB1 P09429 1/20 0.36
▸ CXCL12 P48061 1/20 0.36
▸ CA2 P00918 1/20 0.35
▸ POLB P06746 1/20 0.35
▸ TYR P14679 1/20 0.35
▸ SMN1; SMN2 Q16637 1/20 0.35
▸ NFKB1 P19838 1/20 0.35
▸ NFKB2 Q00653 1/20 0.35
▸ RELA Q04206 1/20 0.35
▸ CISD2 Q8N5K1 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9166140 0.98 CYP2C9 (0.43) CYP2C9CYP2C19NPSR1NR2F2KDM4E
SCHEMBL13548419 0.84 CYP2C9 (0.46) CYP2C9CYP2C19NPSR1KDM4EMAPT
SCHEMBL12276981 0.81 KDM4E (0.58) CYP2C9CYP2C19NPSR1KDM4EALDH1A1
SCHEMBL8395371 0.79 GAA (0.45) NR2F2KDM4EALDH1A1LMNAGAA
SCHEMBL27909943 0.77 CYP2C9 (0.56) CYP2C9CYP2C19NPSR1KDM4ENFKB1
SCHEMBL6350428 0.77 CYP2C9 (0.41) CYP2C9CYP2C19NPSR1EGFRCA2
SCHEMBL12301378 0.76 KMT2A (0.44) CYP2C9CYP2C19NPSR1MAPTSMN1; SMN2
SCHEMBL2218707 0.75 CSNK2A1 (0.56) KDM4ELMNAEGFRCA2POLB
SCHEMBL28413744 0.74 ALDH1A1 (0.48) CYP2C9NR2F2KDM4EALDH1A1LMNA
SCHEMBL29670017 0.74 ALDH1A1 (0.48) CYP2C9NR2F2KDM4EALDH1A1LMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2024122425-A1 RESIST COMPOSITION, RESIST PATTERN FORMATION METHOD, COMPOUND, AND ACID DIFFUSION CONTROL AGENT 東京応化工業株式会社 2024-06-13 — — WO disclosed
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