Predicted protein targets (top 12)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.52 |
| ▸ | KMT2A | Q03164 | 5/20 | 0.47 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.47 |
| ▸ | LMNA | P02545 | 5/20 | 0.44 |
| ▸ | HTT | P42858 | 4/20 | 0.44 |
| ▸ | MEN1 | O00255 | 3/20 | 0.43 |
| ▸ | MAPT | P10636 | 4/20 | 0.43 |
| ▸ | NPSR1 | Q6W5P4 | 2/20 | 0.43 |
| ▸ | MAPK1 | P28482 | 2/20 | 0.43 |
| ▸ | PLA2G1B | P04054 | 1/20 | 0.43 |
| ▸ | RAD52 | P43351 | 1/20 | 0.43 |
| ▸ | ATG4B | Q9Y4P1 | 1/20 | 0.43 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL13103376 | 1.00 | ALDH1A1 (0.52) | ALDH1A1KMT2AKDM4ELMNAHTT | |
| SCHEMBL19188985 | 0.84 | ALDH1A1 (0.38) | ALDH1A1KMT2AKDM4ELMNAHTT | |
| SCHEMBL7688059 | 0.83 | ALDH1A1 (0.56) | ALDH1A1KMT2AKDM4ELMNAHTT | |
| SCHEMBL2739882 | 0.83 | KMT2A (0.51) | ALDH1A1KMT2AKDM4ELMNAHTT | |
| SCHEMBL28263399 | 0.81 | ALDH1A1 (0.55) | ALDH1A1KMT2AKDM4ELMNAHTT | |
| SCHEMBL75298 | 0.81 | ALDH1A1 (0.55) | ALDH1A1KMT2AKDM4ELMNAHTT | |
| SCHEMBL2739884 | 0.80 | KMT2A (0.52) | ALDH1A1KMT2AKDM4ELMNAHTT | |
| SCHEMBL10075953 | 0.80 | ALDH1A1 (0.54) | ALDH1A1KMT2AKDM4ELMNAHTT | |
| SCHEMBL5824224 | 0.80 | ALDH1A1 (0.54) | ALDH1A1KMT2AKDM4ELMNAHTT | |
| SCHEMBL147278 | 0.80 | ALDH1A1 (0.54) | ALDH1A1KMT2AKDM4ELMNAHTT |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 16 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20170305848-A1 | SULFONIUM SALT, PHOTOACID GENERATOR, AND PHOTOSENSITIVE COMPOSITION | TOKYO OHKA KOGYO CO., LTD. (JP) | 2017-10-26 | — | — | US | disclosed |
| US-9732213-B2 | Rheology modifier compositions and methods of use | RHODIA OPERATIONS (FR) | 2017-08-15 | — | — | US | disclosed |
| US-9434846-B2 | Anti-settling and thickening compositions and methods for using same | RHODIA OPERATIONS (FR) | 2016-09-06 | — | — | US | disclosed |
| US-20160113856-A1 | COMPOSITIONS WITH PH RESPONSIVE COPOLYMER CONTAINING MAEP AND/OR MAHP AND METHODS FOR USING SAME | RHODIA OPERATIONS (FR) | 2016-04-28 | — | — | US | disclosed |
| US-9090727-B2 | Rheology modifier polymer | RHODIA OPERATIONS (FR) | 2015-07-28 | — | — | US | disclosed |
| US-9080135-B2 | Compositions with freeze thaw stability | RHODIA OPERATIONS (FR) | 2015-07-14 | — | — | US | disclosed |
| US-20150183979-A1 | RHEOLOGY MODIFIER COMPOSITIONS AND METHODS OF USE | RHODIA OPERATIONS (FR) | 2015-07-02 | — | — | US | disclosed |
| US-20140301966-A1 | RHEOLOGY MODIFIER POLYMER | SPECIALTY OPERATIONS FRANCE (FR) | 2014-10-09 | — | — | US | disclosed |
| US-20140178325-A1 | Anti-Settling and Thickening Compositions and Methods for Using Same | RHODIA OPERATIONS (FR) | 2014-06-26 | — | — | US | disclosed |
| US-8114949-B2 | (Meth)acrylate, polymer and resist composition | MITSUBISHI RAYON CO., LTD. (JP) | 2012-02-14 | — | — | US | disclosed |
| US-8088875-B2 | (Meth)acrylate, polymer and resist composition | MITSUBISHI RAYON CO., LTD. (JP) | 2012-01-03 | — | — | US | disclosed |
| US-20110223125-A1 | COMPOSITIONS WITH FREEZE THAW STABILITY | RHODIA OPERATIONS (FR) | 2011-09-15 | — | — | US | disclosed |
| US-20100266952-A1 | CYCLIC COMPOUND, PHOTORESIST BASE, PHOTORESIST COMPOSITION, MICROFABRICATION PROCESS, AND SEMICONDUCTOR DEVICE | IDEMITSU KOSAN CO., LTD. (JP) | 2010-10-21 | — | — | US | disclosed |
| US-20100266952-A1 | CYCLIC COMPOUND, PHOTORESIST BASE, PHOTORESIST COMPOSITION, MICROFABRICATION PROCESS, AND SEMICONDUCTOR DEVICE | IDEMITSU KOSAN CO., LTD. (JP) | 2010-10-21 | — | — | US | disclosed |
| US-20090226851-A1 | (METH)ACRYLATE, POLYMER AND RESIST COMPOSITION | MITSUBISHI RAYON CO., LTD. (JP) | 2009-09-10 | — | — | US | disclosed |
| US-20080003529-A1 | (Meth)Acrylate, Polymer and Resist Composition | MITSUBISHI RAYON CO., LTD. (JP) | 2008-01-03 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (6 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20160113856-A1 | COMPOSITIONS WITH PH RESPONSIVE COPOLYMER CONTAINING MAEP AND/OR MAHP AND METHODS FOR USING SAME | PRUNE1, PHLPP1, PHLPP2 | ALDH1A1 2142/4885KMT2A 428/4885KDM4E 162/4885 |
| US-20170305848-A1 | SULFONIUM SALT, PHOTOACID GENERATOR, AND PHOTOSENSITIVE COMPOSITION | ARSA, SPIN1, ASIC1 | ALDH1A1 2376/4885KMT2A 1881/4885KDM4E 3853/4885 |
| US-20110223125-A1 | COMPOSITIONS WITH FREEZE THAW STABILITY | C9, PUF60, BCL2L10 | ALDH1A1 1380/4885KMT2A 4329/4885KDM4E 3189/4885 |
| US-20140301966-A1 | RHEOLOGY MODIFIER POLYMER | C1R, PUF60, C9 | ALDH1A1 3739/4885KMT2A 1415/4885KDM4E 1849/4885 |
| US-20100266952-A1 | CYCLIC COMPOUND, PHOTORESIST BASE, PHOTORESIST COMPOSITION, MICROFABRICATION PROCESS, AND SEMICONDUCTOR DEVICE | C1S, CCNL2, CCNT1 | ALDH1A1 2673/4885KMT2A 737/4885KDM4E 1401/4885 |
| US-20140178325-A1 | Anti-Settling and Thickening Compositions and Methods for Using Same | GRN, CAPG, C5 | ALDH1A1 4532/4885KMT2A 3218/4885KDM4E 1076/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.