Predicted protein targets (top 13)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KDM4E | B2RXH2 | 9/20 | 0.47 |
| ▸ | ALDH1A1 | P00352 | 9/20 | 0.47 |
| ▸ | MAPT | P10636 | 4/20 | 0.47 |
| ▸ | KMT2A | Q03164 | 3/20 | 0.47 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.47 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.47 |
| ▸ | MEN1 | O00255 | 2/20 | 0.42 |
| ▸ | LMNA | P02545 | 2/20 | 0.42 |
| ▸ | HPGD | P15428 | 4/20 | 0.42 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.41 |
| ▸ | GAA | P10253 | 2/20 | 0.41 |
| ▸ | NPC1 | O15118 | 1/20 | 0.40 |
| ▸ | RAB9A | P51151 | 1/20 | 0.40 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL27424876 | 0.88 | KDM4E (0.47) | KDM4EALDH1A1MAPTHPGDGAA | |
| SCHEMBL27424555 | 0.84 | KDM4E (0.56) | KDM4EALDH1A1MAPTKMT2ATDP1 | |
| SCHEMBL24710438 | 0.83 | KDM4E (0.46) | KDM4EALDH1A1MAPTKMT2AL3MBTL1 | |
| SCHEMBL10694794 | 0.78 | KDM4E (0.59) | KDM4EALDH1A1MAPTKMT2ATDP1 | |
| SCHEMBL10694789 | 0.78 | KDM4E (0.59) | KDM4EALDH1A1MAPTKMT2ATDP1 | |
| SCHEMBL21457151 | 0.77 | ALDH1A1 (0.58) | KDM4EALDH1A1MAPTKMT2ATDP1 | |
| SCHEMBL21457153 | 0.77 | ALDH1A1 (0.58) | KDM4EALDH1A1MAPTKMT2ATDP1 | |
| SCHEMBL10694876 | 0.77 | ALDH1A1 (0.58) | KDM4EALDH1A1MAPTKMT2ATDP1 | |
| SCHEMBL10693214 | 0.77 | ALDH1A1 (0.62) | KDM4EALDH1A1MAPTKMT2ATDP1 | |
| SCHEMBL27424809 | 0.77 | MAPT (0.43) | KDM4EALDH1A1MAPTKMT2AL3MBTL1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20240219834-A1 | METHOD FOR FORMING A RESIST PATTERN | NISSAN CHEMICAL CORPORATION (JP) | 2024-07-04 | — | — | US | disclosed |