SCHEMBL27424809

SCHEMBL27424809

N#CC(C#N)=Cc1ccc(OCC(O)Cn2c(=O)n(CC(O)COC(=O)c3ccc(C=C(C#N)C#N)cc3)c(=O)n(CC(O)COC(=O)c3ccc(C=C(C#N)C#N)cc3)c2=O)cc1

nearest known ligand 0.43

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MAPT P10636 8/20 0.43
ALDH1A1 P00352 6/20 0.43
KDM4E B2RXH2 3/20 0.43
MAPK1 P28482 2/20 0.41
SMN1; SMN2 Q16637 2/20 0.41
TSHR P16473 2/20 0.41
GALR3 O60755 1/20 0.41
RAB9A P51151 1/20 0.41
MEN1 O00255 1/20 0.40
KMT2A Q03164 1/20 0.40
POLB P06746 1/20 0.40
ADRB2 P07550 3/20 0.39
ADRB1 P08588 3/20 0.39
ADRB3 P13945 3/20 0.39
L3MBTL1 Q9Y468 1/20 0.39
CYP1A2 P05177 1/20 0.38
CYP3A4 P08684 1/20 0.38
HPGD P15428 1/20 0.38
NFKB1 P19838 1/20 0.38
APEX1 P27695 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL27424772 1.00 MAPT (0.43) MAPTALDH1A1KDM4EMAPK1SMN1; SMN2
SCHEMBL27424810 0.94 ADRB2 (0.41) MAPTALDH1A1KDM4ESMN1; SMN2TSHR
SCHEMBL27424954 0.93 ADRB2 (0.41) MAPTALDH1A1KDM4EMAPK1SMN1; SMN2
SCHEMBL24710438 0.90 KDM4E (0.46) MAPTALDH1A1KDM4EMAPK1SMN1; SMN2
SCHEMBL27424953 0.87 ADRB2 (0.36) MAPTALDH1A1KDM4ESMN1; SMN2TSHR
SCHEMBL24710434 0.84 MEN1 (0.58) MAPTALDH1A1KDM4ESMN1; SMN2RAB9A
SCHEMBL27424952 0.83 LMNA (0.45) MAPTALDH1A1KDM4EMAPK1SMN1; SMN2
SCHEMBL27424876 0.79 KDM4E (0.47) MAPTALDH1A1KDM4ERAB9ACYP3A4
SCHEMBL27424847 0.77 KDM4E (0.47) MAPTALDH1A1KDM4ESMN1; SMN2RAB9A
SCHEMBL24710420 0.75 MAPT (0.47) MAPTALDH1A1KDM4EMAPK1SMN1; SMN2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20240219834-A1 METHOD FOR FORMING A RESIST PATTERN NISSAN CHEMICAL CORPORATION (JP) 2024-07-04 US disclosed