SCHEMBL27424876

SCHEMBL27424876

N#C/C(=C/c1ccc(OCC(O)Cn2c(=O)n(CC(O)COc3ccc(/C=C(/C#N)C(=O)O)cc3)c(=O)n(CC(O)COc3ccc(/C=C(\C#N)C(=O)O)cc3)c2=O)cc1)C(=O)O

nearest known ligand 0.52

Predicted protein targets (top 13)

geneUniProtsupporting neighboursconfidence
KDM4E B2RXH2 2/20 0.47
CISD1 Q9NZ45 1/20 0.47
SLC16A3 O15427 1/20 0.47
ALDH1A1 P00352 1/20 0.47
CYP3A4 P08684 1/20 0.47
HPGD P15428 1/20 0.47
SLC16A1 P53985 1/20 0.47
GPR35 Q9HC97 1/20 0.47
EGFR P00533 1/20 0.47
NPC1 O15118 1/20 0.45
GAA P10253 1/20 0.45
MAPT P10636 1/20 0.45
RAB9A P51151 1/20 0.45

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL27424847 0.88 KDM4E (0.47) KDM4EALDH1A1HPGDNPC1GAA
SCHEMBL24710438 0.85 KDM4E (0.46) KDM4ECISD1ALDH1A1CYP3A4HPGD
SCHEMBL27424557 0.84 KDM4E (0.55) KDM4ECISD1SLC16A3ALDH1A1CYP3A4
SCHEMBL27424772 0.79 MAPT (0.43) KDM4EALDH1A1CYP3A4HPGDMAPT
SCHEMBL27424809 0.79 MAPT (0.43) KDM4EALDH1A1CYP3A4HPGDMAPT
SCHEMBL27424952 0.79 LMNA (0.45) KDM4EALDH1A1CYP3A4HPGDEGFR
SCHEMBL27424569 0.75 KMT2A (0.56) KDM4ECISD1SLC16A3ALDH1A1CYP3A4
SCHEMBL23572564 0.74 ALDH1A1 (0.59) KDM4ECISD1SLC16A3ALDH1A1CYP3A4
SCHEMBL9361345 0.74 ALDH1A1 (0.59) KDM4ECISD1SLC16A3ALDH1A1CYP3A4
SCHEMBL9361355 0.74 ALDH1A1 (0.59) KDM4ECISD1SLC16A3ALDH1A1CYP3A4

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20240219834-A1 METHOD FOR FORMING A RESIST PATTERN NISSAN CHEMICAL CORPORATION (JP) 2024-07-04 US disclosed