SCHEMBL27426714

SCHEMBL27426714

CC(=O)Oc1c(I)cc(C=O)c(I)c1OC(C)=O

nearest known ligand 0.41

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ MCL1 Q07820 1/20 0.41
▸ HCRTR1 O43613 1/20 0.36
▸ HCRTR2 O43614 1/20 0.36
▸ POLB P06746 1/20 0.36
▸ NLRP3 Q96P20 1/20 0.36
▸ ERN1 O75460 2/20 0.34
▸ FNTA P49354 1/20 0.33
▸ FNTB P49356 1/20 0.33
▸ TOP1 P11387 2/20 0.33
▸ BACE1 P56817 1/20 0.33
▸ CYP3A4 P08684 1/20 0.33
▸ TUBB4A P04350 1/20 0.32
▸ TUBB P07437 1/20 0.32
▸ TUBA3C P0DPH7 1/20 0.32
▸ TUBA1B P68363 1/20 0.32
▸ TUBA4A P68366 1/20 0.32
▸ TUBB4B P68371 1/20 0.32
▸ TUBB3 Q13509 1/20 0.32
▸ TUBB2A Q13885 1/20 0.32
▸ TUBB8 Q3ZCM7 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL24110765 0.92 MCL1 (0.49) MCL1HCRTR1HCRTR2POLBNLRP3
SCHEMBL22991542 0.85 POLB (0.35) MCL1POLBNLRP3TOP1BACE1
SCHEMBL6363949 0.80 POLB (0.43) POLBNLRP3TOP1BACE1CYP3A4
SCHEMBL24110726 0.78 MCL1 (0.48) MCL1HCRTR1HCRTR2POLBNLRP3
SCHEMBL23559320 0.77 FNTA (0.43) MCL1POLBNLRP3FNTAFNTB
SCHEMBL12947812 0.75 MAPK1 (0.42) FNTAFNTBTOP1HTTKDM4E
SCHEMBL22991507 0.75 POLB (0.35) MCL1POLBNLRP3TOP1BACE1
SCHEMBL22991606 0.72 POLB (0.39) POLBNLRP3TOP1BACE1CYP3A4
SCHEMBL13168497 0.71 FNTA (0.49) POLBNLRP3FNTAFNTBTOP1
SCHEMBL24110488 0.71 MCL1 (0.38) MCL1POLBNLRP3BACE1TUBB4A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2024135708-A1 METHOD FOR PRODUCING COMPOUND, POLYMER, COMPOSITION, AND PATTERN FORMATION METHOD 三菱瓦斯化学株式会社 2024-06-27 — — WO disclosed
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