SCHEMBL24110726

SCHEMBL24110726

COc1c(I)cc(C=O)c(OC(C)=O)c1C

nearest known ligand 0.48

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ MCL1 Q07820 1/20 0.48
▸ POLB P06746 2/20 0.39
▸ ABCB11 O95342 1/20 0.37
▸ TPMT P51580 1/20 0.36
▸ HCRTR1 O43613 1/20 0.36
▸ HCRTR2 O43614 1/20 0.36
▸ CA1 P00915 1/20 0.35
▸ CA2 P00918 1/20 0.35
▸ ERN1 O75460 3/20 0.35
▸ TUBB4A P04350 2/20 0.35
▸ TUBB P07437 2/20 0.35
▸ TUBA3C P0DPH7 2/20 0.35
▸ TUBA1B P68363 2/20 0.35
▸ TUBA4A P68366 2/20 0.35
▸ TUBB4B P68371 2/20 0.35
▸ TUBB3 Q13509 2/20 0.35
▸ TUBB2A Q13885 2/20 0.35
▸ TUBB8 Q3ZCM7 2/20 0.35
▸ TUBA3E Q6PEY2 2/20 0.35
▸ TUBA1A Q71U36 2/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL24110727 0.84 POLB (0.44) POLBABCB11CA1CA2ERN1
SCHEMBL24110765 0.83 MCL1 (0.49) MCL1POLBABCB11TPMTHCRTR1
SCHEMBL24110579 0.82 MCL1 (0.43) MCL1TPMTHCRTR1HCRTR2CA1
SCHEMBL24106351 0.78 ABCB11 (0.42) POLBABCB11TPMTTUBB4ATUBB
SCHEMBL27426714 0.78 MCL1 (0.41) MCL1POLBABCB11HCRTR1HCRTR2
SCHEMBL26874970 0.78 MCL1 (0.53) MCL1TPMTCA1CA2ERN1
SCHEMBL10734426 0.77 POLB (0.47) POLBABCB11ERN1TUBB4ATUBB
SCHEMBL24106259 0.75 ABCB11 (0.36) POLBABCB11TPMTTUBB4ATUBB
SCHEMBL24110488 0.73 MCL1 (0.38) MCL1POLBABCB11TPMTTUBB4A
SCHEMBL24110531 0.72 ALDH1A1 (0.50) MCL1HCRTR1HCRTR2ERN1ALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11815813-B2 Compound, resin, resist composition and method for producing resist pattern SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2023-11-14 — — US disclosed
US-11815813-B2 Compound, resin, resist composition and method for producing resist pattern SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2023-11-14 — — US disclosed
US-20210389672-A1 COMPOUND, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2021-12-16 — — US disclosed
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