SCHEMBL27437101

SCHEMBL27437101

CCCCCCSCC(=O)OC(C)C

nearest known ligand 0.59

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
LMNA P02545 3/20 0.59
CES2 O00748 3/20 0.56
MAPT P10636 3/20 0.56
GMNN O75496 1/20 0.56
TP53 P04637 1/20 0.56
POLB P06746 1/20 0.56
THRB P10828 1/20 0.56
CYP2C9 P11712 1/20 0.56
BLM P54132 1/20 0.56
HSD17B10 Q99714 1/20 0.56
FAAH O00519 8/20 0.50
CES1 P23141 5/20 0.50
PLA2G6 O60733 1/20 0.50
EPHX1 P07099 1/20 0.43
MAPK1 P28482 1/20 0.40
PLA2G4B P0C869 1/20 0.38
CA2 P00918 1/20 0.38
ALDH1A1 P00352 1/20 0.38
CNR1 P21554 1/20 0.37
CNR2 P34972 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4813829 0.83 MAPT (0.62) LMNACES2MAPTGMNNTP53
SCHEMBL5407620 0.81 CES2 (0.51) LMNACES2MAPTGMNNTP53
SCHEMBL6026492 0.80 ALDH1A1 (0.59) LMNACES2MAPTGMNNTP53
Hydrochloric Acid SCHEMBL5403742 0.80 CES2 (0.50) LMNACES2MAPTGMNNTP53
Tritetradecylthioacetyl Glycerol SCHEMBL4815254 0.80 ALDH1A1 (0.59) LMNACES2MAPTGMNNTP53
SCHEMBL14178795 0.80 ALDH1A1 (0.59) LMNACES2MAPTGMNNTP53
SCHEMBL4300387 0.79 CES2 (0.62) CES2MAPTGMNNTP53POLB
SCHEMBL10745729 0.79 CES2 (0.62) CES2MAPTGMNNTP53POLB
SCHEMBL9857500 0.79 CES2 (0.62) CES2MAPTGMNNTP53POLB
SCHEMBL10066865 0.79 CES2 (0.62) CES2MAPTGMNNTP53POLB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-12032290-B2 Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic device FUJIFILM CORPORATION (JP) 2024-07-09 US disclosed