SCHEMBL2744596

SCHEMBL2744596

CN(Nc1ccccc1)c1ccccc1

nearest known ligand 0.45

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
RAB9A P51151 1/20 0.44
SMN1; SMN2 Q16637 1/20 0.44
TSHR P16473 4/20 0.42
HTT P42858 2/20 0.41
MEN1 O00255 2/20 0.41
KMT2A Q03164 2/20 0.41
ALDH1A1 P00352 4/20 0.39
TDP1 Q9NUW8 4/20 0.39
HSD17B10 Q99714 3/20 0.39
CTSD P07339 1/20 0.39
L3MBTL1 Q9Y468 2/20 0.39
LMNA P02545 1/20 0.39
NR3C2 P08235 1/20 0.38
MAPK1 P28482 2/20 0.38
ALOX15 P16050 1/20 0.38
ALOX12 P18054 1/20 0.38
PTGS1 P23219 1/20 0.38
SLC6A2 P23975 1/20 0.38
PTGS2 P35354 1/20 0.38
HTR2B P41595 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Hydrochloric Acid SCHEMBL28078944 0.98 RAB9A (0.42) RAB9ASMN1; SMN2TSHRHTTMEN1
Acetic Acid SCHEMBL28078963 0.89 RAB9A (0.50) RAB9ASMN1; SMN2TSHRHTTMEN1
Acetic Acid SCHEMBL28853221 0.89 RAB9A (0.50) RAB9ASMN1; SMN2TSHRHTTMEN1
SCHEMBL9224281 0.87 HPGD (0.50) RAB9ASMN1; SMN2TSHRHTTMEN1
SCHEMBL9571711 0.82 CYP1A2 (0.47) RAB9ASMN1; SMN2HTTMEN1KMT2A
SCHEMBL11768312 0.80 MEN1 (0.46) RAB9ASMN1; SMN2TSHRHTTMEN1
SCHEMBL27270538 0.78 ALDH1A1 (0.56) RAB9ASMN1; SMN2TSHRHTTMEN1
SCHEMBL54929 0.76 TSHR (0.48) RAB9ASMN1; SMN2TSHRALDH1A1TDP1
SCHEMBL267039 0.74 SMN1; SMN2 (0.47) RAB9ASMN1; SMN2TSHRMEN1KMT2A
SCHEMBL1794087 0.74 SMN1; SMN2 (0.47) RAB9ASMN1; SMN2TSHRMEN1KMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 37 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-RE38613-E1 Method for growing a nitride compound semiconductor SONY CORPORATION (JP) 2004-10-05 US claimed
US-6413312-B1 P-TYPE NITRIDE III-V, SUCH AS GALLIUM NITRIDE; METAL ORGANIC CHEMICAL VAPOR DEPOSITION USING AN ARYLALKYL HYDRAZINE NITROGEN SOURCE WHICH DOES NOT RELEASE HYDROGEN; HIGH CARRIER CONCENTRATION; NO ANNEALING; LIGHT EMITTING DIODES; LASERS SONY CORPORATION (JP) 2002-07-02 US claimed
US-6043140-A VAPOR DEPOSITION METHODS USING A NITROGEN SOURCE MATERIAL WHICH DOES NOT RELEASE HYDROGEN DURING RELEASE OF NITROGEN COMPRISING A SEC. OR TERT. AMINE, AN AZO COMPOUND, AN AZIDE OR AN ALKYL- AND PHENYL-SUBSTITUTED HYDRAZINE SONY CORPORATION (JP) 2000-03-28 US claimed
US-4017477-A 3-Halogeno-6-hydroxy-pyridone-(2) azo dyestuffs CIBA-GEIGY AG (CH) 1977-04-12 US claimed
CN-116162041-B Preparation method of azo compound 江苏中利集团股份有限公司 2023-06-27 CN disclosed
CN-116162041-A Preparation method of azo compound 江苏中利集团股份有限公司 2023-05-26 CN disclosed
CN-110551042-B Preparation method of aromatic azo organic compound 云南民族大学 2022-08-23 CN disclosed
CN-110551042-A preparation method of aromatic azo organic compound UNIV YUNNAN MINZU 2019-12-10 CN disclosed
CN-105873928-B 5 hydroxyl 4 (trifluoromethyl) pyrazolo pyridine derivatives 第三共株式会社 2018-01-23 CN disclosed
CN-105873928-A 5-hydroxy-4-(trifluoromethyl)pyrazolopyridine derivative 第三共株式会社 2016-08-17 CN disclosed
WO-2013070908-A1 THERAPEUTIC METHOD FIBROGEN, INC. (US) 2013-05-16 WO disclosed
US-8180444-B2 Enhanced PhotoDynamic Therapy with immune system assist BIOLITEC PHARMA MARKETING LTD (MY) 2012-05-15 US disclosed
US-5654089-A IMAGING ELEMENTS EASTMAN KODAK COMPANY (US) 1997-08-05 US disclosed
US-5455153-A Cladding is a oxidatively polymerizable polymer EASTMAN KODAK COMPANY (US) 1995-10-03 US disclosed
EP-0646837-A1 Clad vanadium pentoxide materials, conductive layers and photographic elements containing the same EASTMAN KODAK COMPANY (US) 1995-04-05 EP disclosed
US-5149789-A Triazine dyes BASF AKTIENGESELLSCHAFT (DE) 1992-09-22 US disclosed
CN-1043927-A With the multi-silicon nitrogen silane is the precursor composition and the ceramic raw material that is obtained by the said composition pyrolysis of the pottery of main component ATOCHEM (FR) 1990-07-18 CN disclosed
US-4795687-A POLYTHIENYLENE, POLYPRYRROLE OR POLYANILINE MATERIAL PREPARED BY OXIDATION POLYMERIZATION MITSUBISHI KASEI CORP. (JP) 1989-01-03 US disclosed
EP-0261837-A2 Electrically conductive material and a process for the preparation of same and secondary battery using the electrically conductive material Sanyo Electric Co., Ltd (JP) 1988-03-30 EP disclosed
US-4006127-A Cationic diazacyanine dyestuffs BAYER AKTIENGESELLSCHAFT (DT) 1977-02-01 US disclosed