SCHEMBL2745558

SCHEMBL2745558

[c]1ccc(Oc2c(C34CC5CC(CC(C5)C3)C4)c(C34CC5CC(CC(C5)C3)C4)c(C34CC5CC(CC(C5)C3)C4)c(C34CC5CC(CC(C5)C3)C4)c2C23CC4CC(CC(C4)C2)C3)cc1

nearest known ligand 0.33

Predicted protein targets (top 11)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 2/20 0.33
LMNA P02545 2/20 0.33
MEN1 O00255 3/20 0.33
KMT2A Q03164 3/20 0.33
L3MBTL1 Q9Y468 1/20 0.33
EPHX2 P34913 3/20 0.32
RAB9A P51151 1/20 0.31
POLB P06746 1/20 0.31
GAA P10253 1/20 0.31
GFER P55789 1/20 0.31
NPC1 O15118 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2745554 0.74 ALDH1A1 (0.32) ALDH1A1LMNAMEN1KMT2AEPHX2
SCHEMBL67257 0.70 LMNA (0.57) ALDH1A1LMNAMEN1KMT2AL3MBTL1
SCHEMBL677076 0.69 GAA (0.33) ALDH1A1LMNAMEN1KMT2AL3MBTL1
SCHEMBL1283337 0.66 SCN9A (0.39) ALDH1A1LMNAMEN1KMT2AL3MBTL1
SCHEMBL2747763 0.65 EPHX2 (0.39) LMNAL3MBTL1EPHX2RAB9ANPC1
SCHEMBL2747797 0.65 KDM4E (0.33) NPC1
SCHEMBL27845478 0.65 LMNA (0.61) ALDH1A1LMNAMEN1KMT2AL3MBTL1
SCHEMBL18317467 0.65 LMNA (0.55) ALDH1A1LMNAMEN1KMT2AL3MBTL1
SCHEMBL2746941 0.64
SCHEMBL11473992 0.64 GAA (0.68) ALDH1A1LMNAMEN1KMT2ARAB9A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8337982-B2 Comprising first repeating unit obtained by reaction of bisaminophenol compound and dicarboxylic acid, at least one of which has diamondoid structure and second repeating unit obtained by reaction of bisaminophenol compound having no diamondoid structure and dicarboxylic acid; heat resistance SUMITOMO BAKELITE CO., LTD. (JP) 2012-12-25 US disclosed
US-8178631-B2 Resin composition, varnish, resin film and semiconductor device SUMITOMO BAKELITE COMPANY, LTD. (JP) 2012-05-15 US disclosed
US-20090214860-A1 Resin Composition, Varnish, Resin Film and Semiconductor Device SUMITOMO BAKELITE COMPANY, LTD. (JP) 2009-08-27 US disclosed
US-20080206548-A1 Benzoxazole Resin Precursor, Polybenzoxazole Resin, Resin Film And Semiconductor Device SUMITOMO BAKELITE CO., LTD (JP) 2008-08-28 US disclosed
EP-1953181-A1 RESIN COMPOSITION, VARNISH, RESIN FILM AND SEMICONDUCTOR DEVICE Sumitomo Bakelite Company, Ltd. (JP) 2008-08-06 EP disclosed
EP-1832619-A1 BENZOXAZOLE RESIN PRECURSOR, POLYBENZOXAZOLE RESIN, RESIN FILM, AND SEMICONDUCTOR DEVICE Sumitomo Bakelite Company, Limited (JP) 2007-09-12 EP disclosed