SCHEMBL27458096

SCHEMBL27458096

C=CC(=O)C(C)CN=C=O

nearest known ligand 0.31

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
TSHR P16473 2/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL195839 0.78
SCHEMBL28226415 0.78 LMNA (0.31)
SCHEMBL10792704 0.74
SCHEMBL27599259 0.74
SCHEMBL28624133 0.72 ALDH1A1 (0.32)
SCHEMBL2830959 0.72 TSHR (0.40) TSHR
SCHEMBL30201363 0.71
SCHEMBL20918281 0.71 TSHR (0.32) TSHR
SCHEMBL4655872 0.70
SCHEMBL11270823 0.70 SLC22A6 (0.36) TSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 31 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-1898290-A Radiation hardenable compositions, method for the production and the use thereof DEGUSSA (DE) 2007-01-17 CN claimed
CN-1878814-A Radiation curable modified, unsaturated, amorphous polyesters DEGUSSA (DE) 2006-12-13 CN claimed
CN-111587503-B Polymer for electrode protection layer and secondary battery using the same 株式会社LG新能源 2023-02-28 CN disclosed
CN-111587503-A Polymer for electrode protection layer and secondary battery using the same 株式会社LG化学 2020-08-25 CN disclosed
CN-110337472-A The manufacturing method of active energy ray curable lithographic printing ink and the printed article using it 东丽株式会社 2019-10-15 CN disclosed
CN-104685976-B The manufacturing method of conductive pattern 东丽株式会社 2019-05-31 CN disclosed
CN-109716491-A The manufacturing method of field effect transistor and the manufacturing method of wireless telecom equipment 东丽株式会社 2019-05-03 CN disclosed
CN-108292630-A Ferroelectric memory element, its manufacturing method and using its storage unit and use its wireless communication device 东丽株式会社 2018-07-17 CN disclosed
CN-107925147-A The manufacture method of antenna substrate, the manufacture method of antenna substrate and the manufacture method of RFID device with wiring and electrode 东丽株式会社 2018-04-17 CN disclosed
CN-103688221-B Photosensitive resin composition, cured product and spacer 三洋化成工业株式会社 2016-08-17 CN disclosed
CN-101992141-B Method for producing powder particle by using grinding medium TORAY INDUSTRIES 2015-07-01 CN disclosed
CN-1238765-C Sensitive paste-like material, plasma display and mfg. method thereof TORAY INDUSTRIES (JP) 2006-01-25 CN disclosed
CN-1707735-A Plasma display device TORAY INDUSTRIES (JP) 2005-12-14 CN disclosed
CN-1597772-A Radiation-curable resins based on ketone-aldehyde and/or urea-aldehyde resins and a process for preparing them DEGUSSA (DE) 2005-03-23 CN disclosed
CN-1594387-A Radiation-curable resins based on hydrogenated ketone-aldehyde and phenol-aldehyde resins and a process for preparing them DEGUSSA (DE) 2005-03-16 CN disclosed
CN-1515962-A Sensitive paste-like material, plasma display and mfg. method thereof 东丽株式会社 2004-07-28 CN disclosed
CN-1123040-C Method and device for mfg. plasma display TORAY INDUSTRIES (JP) 2003-10-01 CN disclosed
CN-1119701-C Photosensitive paste, plasma display and process for production thereof TORAY INDUSTRIES (JP) 2003-08-27 CN disclosed
CN-1216149-A Method and device for mfg. plasma display TORAY INDUSTRIES (JP) 1999-05-05 CN disclosed
CN-1157042-A Photosensitive paste, plasma display and process for production thereof TORAY INDUSTRIES (JP) 1997-08-13 CN disclosed