SCHEMBL274635

SCHEMBL274635

CC(C)(CO)COC(=O)CCCCC(=O)OCC(C)(C)CO

nearest known ligand 0.42

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
DGKA P23743 1/20 0.42
PAM P19021 2/20 0.38
LMNA P02545 2/20 0.38
KDM4E B2RXH2 1/20 0.38
DUSP3 P51452 1/20 0.38
MEN1 O00255 1/20 0.38
KMT2A Q03164 1/20 0.38
CYP1A2 P05177 1/20 0.38
TSHR P16473 3/20 0.36
MAPT P10636 1/20 0.36
PRKCA P17252 2/20 0.36
PRKCE Q02156 1/20 0.36
PRKCQ Q04759 1/20 0.36
PRKCD Q05655 1/20 0.36
P2RY10 O00398 1/20 0.35
GPR34 Q9UPC5 1/20 0.35
DNM1 Q05193 1/20 0.35
ALDH1A1 P00352 1/20 0.35
CYP3A4 P08684 1/20 0.35
ATM Q13315 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29227497 0.98 DGKA (0.45) DGKAPAMLMNAKDM4EDUSP3
SCHEMBL21143366 0.98 DGKA (0.45) DGKAPAMLMNAKDM4EDUSP3
SCHEMBL21143386 0.96 TSHR (0.41) DGKAPAMLMNAKDM4EDUSP3
SCHEMBL13818861 0.94 DGKA (0.38) DGKAPAMLMNAKDM4EDUSP3
SCHEMBL7055063 0.94 DGKA (0.38) DGKAPAMLMNAKDM4EDUSP3
SCHEMBL230981 0.92 TSHR (0.44) PAMLMNAMEN1KMT2ATSHR
SCHEMBL21143363 0.91 ADRA2A (0.38) DGKACYP1A2TSHRMAPTALDH1A1
SCHEMBL755259 0.91 DGKA (0.58) DGKAPAMLMNAKDM4EDUSP3
SCHEMBL754919 0.91 DGKA (0.58) DGKAPAMLMNAKDM4EDUSP3
SCHEMBL3198914 0.91 DGKA (0.58) DGKAPAMLMNAKDM4EDUSP3

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 29 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-114302928-B Coating compositions curable by acetylmichael addition 巴斯夫涂料有限公司 2024-04-16 CN disclosed
US-20220290002-A1 COATING COMPOSITION CURABLE BY ACETO-MICHAEL ADDITION BASF COATINGS GMBH (DE) 2022-09-15 US disclosed
EP-4021998-A1 COATING COMPOSITION CURABLE BY ACETO-MICHAEL ADDITION BASF Coatings GmbH (DE) 2022-07-06 EP disclosed
CN-114302928-A Coating compositions curable by the acetyl michael addition 巴斯夫涂料有限公司 2022-04-08 CN disclosed
WO-2021037792-A1 COATING COMPOSITION CURABLE BY ACETO-MICHAEL ADDITION BASF COATINGS GMBH (DE) 2021-03-04 WO disclosed
US-10884348-B2 Electrophotographic photoreceptor, and electrophotographic cartridge and image forming apparatus including same MITSUBISHI CHEMICAL CORPORATION (JP) 2021-01-05 US disclosed
US-20190219938-A1 ELECTROPHOTOGRAPHIC PHOTORECEPTOR, AND ELECTROPHOTOGRAPHIC CARTRIDGE AND IMAGE FORMING APPARATUS INCLUDING SAME MITSUBISHI CHEMICAL CORPORATION (JP) 2019-07-18 US disclosed
US-20170327716-A1 POLYMER FILM GRAPHICS AVERY DENNISON CORP (US) 2017-11-16 US disclosed
US-20160359195-A1 SOLID ELECTROLYTE COMPOSITION, ELECTRODE SHEET FOR BATTERY AND ALL-SOLID-STATE SECONDARY BATTERY IN WHICH SOLID ELECTROLYTE COMPOSITION IS USED, AND METHOD FOR MANUFACTURING SOLID ELECTROLYTE COMPOSITION FUJIFILM CORPORATION (JP) 2016-12-08 US disclosed
US-20160204468-A1 SOLID ELECTROLYTE COMPOSITION, BINDER FOR ALL-SOLID-STATE SECONDARY BATTERIES, AND ELECTRODE SHEET FOR BATTERIES AND ALL-SOLID-STATE SECONDARY BATTERY EACH USING SAID SOLID ELECTROLYTE COMPOSITION FUJIFILM CORPORATION (JP) 2016-07-14 US disclosed
US-20100047537-A1 METHOD OF PRODUCING LITHOGRAPHIC PRINTING PLATE FUJIFILM CORPORATION (JP) 2010-02-25 US disclosed
US-20090311494-A1 RELIEF PRINTING PLATE PRECURSOR FOR LASER ENGRAVING, RELIEF PRINTING PLATE, AND PROCESS FOR PRODUCING RELIEF PRINTING PLATE FUJIFILM CORPORATION (JP) 2009-12-17 US disclosed
US-20090246653-A1 RELIEF PRINTING PLATE PRECURSOR FOR LASER ENGRAVING, RELIEF PRINTING PLATE, AND METHOD OF MANUFACTURING RELIEF PRINTING PLATE FUJIFILM CORPORATION (JP) 2009-10-01 US disclosed
US-7531291-B2 heat-decomposable cured polyurethane having an aromatic group is directly connected to a urethane bond; high sensitivity to easily form a pattern FUJIFILM CORPORATION (JP) 2009-05-12 US disclosed
US-20090099320-A1 LASER-DECOMPOSABLE RESIN COMPOSITION AND LASER-DECOMPOSABLE PATTERN-FORMING MATERIAL AND FLEXOGRAPHIC PRINTING PLATE PRECURSOR OF LASER ENGRAVING TYPE USING THE SAME FUJIFILM CORPORATION (JP) 2009-04-16 US disclosed
US-20090087790-A1 METHOD OF PRODUCING A NEGATIVE PLANOGRAPHIC PRINTING PLATE FUJIFILM CORPORATION (JP) 2009-04-02 US disclosed
US-20080268371-A1 Polyester, polyurethane, polyether, polyamide, polyurea formed by a monomer containing two imine groups in the back bone and two end groups containing OH, NR2H, COOH, COCL, COOR, NCO and NCS group polymerized with other monomers; a photolatent or heat latent catalyst such as onium compounds, triazines FUJIFILM CORPORATION (JP) 2008-10-30 US disclosed
US-7374863-B2 Polyurethane binder, photoinitiator, and acrylic acid; for use as image recording layer of negative lithographic printing plate precursor; drawing with laser light FUJIFILM CORPORATION (JP) 2008-05-20 US disclosed
US-20080057437-A1 heat-decomposable cured polyurethane having an aromatic group is directly connected to a urethane bond; high sensitivity to easily form a pattern FUJIFILM CORPORATION (JP) 2008-03-06 US disclosed
US-20070021554-A1 Waterborne UV-crosslinkable thiol-ene polyurethane dispersions UNIVERSITY OF SOUTHERN MISSISSIPPI, THE 2007-01-25 US disclosed