SCHEMBL7055063

SCHEMBL7055063

CC(C)(CO)COC(=O)CCCCO

nearest known ligand 0.38

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
DGKA P23743 1/20 0.38
CYP4F2 P78329 3/20 0.37
CYP4A11 Q02928 3/20 0.37
GPR84 Q9NQS5 1/20 0.35
FFAR1 O14842 1/20 0.35
FFAR4 Q5NUL3 1/20 0.35
PAM P19021 2/20 0.35
KDM4E B2RXH2 2/20 0.35
DUSP3 P51452 1/20 0.35
MEN1 O00255 1/20 0.35
KMT2A Q03164 1/20 0.35
LMNA P02545 1/20 0.35
VCAM1 P19320 1/20 0.35
SMN1; SMN2 Q16637 1/20 0.34
CYP1A2 P05177 1/20 0.34
P2RY10 O00398 1/20 0.33
GPR34 Q9UPC5 1/20 0.33
PRKCA P17252 1/20 0.33
PRKCE Q02156 1/20 0.33
PRKCQ Q04759 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL274635 0.94 DGKA (0.42) DGKAPAMKDM4EDUSP3MEN1
1,4-Butanediol SCHEMBL3703747 0.93 GPR84 (0.48) GPR84FFAR1FFAR4PAMMEN1
SCHEMBL21143366 0.92 DGKA (0.45) DGKAPAMKDM4EDUSP3MEN1
SCHEMBL29227497 0.92 DGKA (0.45) DGKAPAMKDM4EDUSP3MEN1
1,6-Hexanediol SCHEMBL2487661 0.92 GPR84 (0.52) GPR84FFAR1FFAR4PAMMEN1
SCHEMBL12289471 0.92 DGKA (0.44) DGKACYP4F2CYP4A11
SCHEMBL12400762 0.90 DGKA (0.44) DGKACYP4F2CYP4A11GPR84FFAR1
1,6-Hexanediol SCHEMBL11423115 0.90 DGKA (0.36) DGKACYP4F2CYP4A11GPR84FFAR1
SCHEMBL21143386 0.90 TSHR (0.41) DGKAPAMKDM4EDUSP3MEN1
SCHEMBL13818861 0.89 DGKA (0.38) DGKAPAMKDM4EDUSP3MEN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6592700-B2 Method of producing retro-reflective sheet with high abrasion resistance SAN FANG CHEMICAL INDUSTRY CO., LTD. (TW) 2003-07-15 US claimed
US-20030039758-A1 Method of producing retro-reflective sheet with high abrasion resistance SAN FANG CHEMICAL INDUSTRY CO., LTD. (TW) 2003-02-27 US claimed
JP-55072066-A None JP disclosed
US-6592700-B2 Method of producing retro-reflective sheet with high abrasion resistance SAN FANG CHEMICAL INDUSTRY CO., LTD. (TW) 2003-07-15 US disclosed
US-20030039758-A1 Method of producing retro-reflective sheet with high abrasion resistance SAN FANG CHEMICAL INDUSTRY CO., LTD. (TW) 2003-02-27 US disclosed
JP-S5572066-A FORMATION OF POLYIMIDE RESIN FILM TOSHIBA CORP 1980-05-30 JP disclosed